X-Ray Metrology for Compound Semiconductor
Bruker provides X-ray metrology tools for both QC monitoring of epi-layer films and for detailed R&D analysis of a wide range of semiconductor films and wafers.
Bruker’s JV-QC3 and JV-QCVelox feature high-intensity sources and high-dynamic-range detectors for fast throughput and repeatable measurements. They enable rapid feedback on the quality and composition of epilayer films, particularly for GaN and III-V materials. This feedback can be communicated locally or automatically to factory host software.
The JV-DX X-ray metrology system provides analysis of thin films used for materials research, process development, and quality control. As an advanced, general-purpose X-ray diffractometer, it incorporates all the standard techniques, coupled with industry-leading analysis software. Its combination of capabilities and features makes JV-DX an ideal, multi-application thin-film materials research tool for your current and future metrology needs.