Locating and quantifying trace metal contamination by TXRF is critical metrology for every process step in semiconductor fabs. The JVX73000F-C is the latest Bruker TXRF spectrometer for full wafers and offers quick, non-destructive, in-line and completely automated trace metal measurements, enabling contamination control in device processing. The JVX7300F-C complies with SEMI standards, comes with the user-friendly JV-TXRF software package and is the latest in TXRF technology and tool innovation.