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X-Ray Metrology for Compound Semiconductor

Bruker provides X-ray metrology tools for both QC monitoring of epi-layer films and for detailed R&D analysis of a wide range of semiconductor films and wafers.

Bruker’s JV-QC3 and JV-QCVelox feature high-intensity sources and high-dynamic-range detectors for fast throughput and repeatable measurements. They enable rapid feedback on the quality and composition of epilayer films, particularly for GaN and III-V materials. This feedback can be communicated locally or automatically to factory host software.

The JV-DX X-ray metrology system provides analysis of thin films used for materials research, process development, and quality control. As an advanced, general-purpose X-ray diffractometer, it incorporates all the standard techniques, coupled with industry-leading analysis software. Its combination of capabilities and features makes JV-DX an ideal, multi-application thin-film materials research tool for your current and future metrology needs.

JV QC3 product image v1

JV-QC3

HRXRD for epilayer quality control of GaN LED and III-V materials

JV QCVelox 3

JV-QCVelox

High performance HRXRD for epilayer quality control of GaN LED and III-V materials

JVDX Tool Image v2

JV-DX

X-ray metrology system for the analysis of thin films for materials’ research, process development and quality control

RADS Software Icon v1

RADS Software

Software that enables fast and accurate XRD measurement analysis