OES (Optical Emission Spectrometry) vs XRF for Positive Materials Identification (PMI) and Alloy Analysis

OES analysis in PMI is a recognized technique to verify elemental composition and grade identification of alloys in the metals industry.  A comprehensive PMI program safeguards your facility from alloy mix-ups which can cause costly accidents.  Although there are other instruments that can perform PMI analysis, the most widely used instrument is the handheld XRF.  Find out how the Bruker S1 TITAN can safeguard your PMI program!

Another common method used for PMI analysis is OES (Optical Emission Spectrometry).  Although both XRF analysis and OES analysis provide alloy grade identification as well as elemental composition, there are some distinct advantages to using handheld XRF:

  • XRF analysis is a completely non-destructive technique whereas OES analysis leaves a burn mark where the analysis was taken
  • XRF requires minimal preparation of the sample, basically a clean surface whereas OES requires a clean, flat, uniform sample
  • XRF can analyze small samples such as wires- OES requires a larger sample size
  • Handheld XRF is extremely portable with a total weight of less than 5lbs- OES is upwards of 40lbs.
  • Send us a message for more info now!
In-process alloy verification

XRF analysis and OES analysis both provide quantitative analysis in percentage and ppm value.  If your PMI program does not require the analysis of Carbon (C) and Boron (B), you will be able to take advantage of the following benefits of using handheld XRF:

  • True portability
  • Increased flexibility in size and shape of the sample being analyzed
  • Truly non-destructive technology
  • Ease of use

As an industry leader, Bruker Elemental has continued to drive handheld XRF technology forward.  Although there are other technologies available for PMI analysis such as wet chemistry, the most accurate and efficient technique and, importantly, non-destructive technique for PMI is handheld XRF.  Contact us now to discuss your PMI program needs!


Also see: