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Nanoscale AFM-IR Spectroscopy and Imaging for Failure Analysis of Electronic Devices

Learn how to characterize nm-features in microelectronics devices using nanoscale IR spectroscopy.
This webinar took place on April 23rd 2020

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Due to the systematic shrinking of the size of devices in the semiconductor industry, characterizing nanoscale surface contaminations in interconnects and circuitries has become a pivotal issue in test and failure analysis. Continuous development in process technology/engineering has led to the fabrication of semiconductor devices with sub-µm feature resolution, which in turn demands high-resolution analytical tools for proper characterization. This webinar explains how photothermal AFM-IR spectroscopy and imaging provides ideal solutions to chemically characterize the organic contaminants, nano-patterned metal/low-k dielectrics, and directed self-assembly of block copolymers used for advanced micro/nano-fabrications


Dr. Anirban Roy
Dr. Anirban Roy
Senior Applications Scientist
Cassandra Phillips
Cassandra Phillips
Sales Applications Scientist