Bruker at SPIE Advanced Lithography + Patterning 2026
Come visit us in Booth 608!
February 22 - 26 | San Jose Convention Center | San Jose, CA
Meet us in San Jose for the SPIE Advanced Lithography + Patterning, where we’ll be showcasing our comprehensive suite of specialized semiconductor technologies. Our solutions include automated atomic force microscopy, automated X-ray metrology, cryo dry cleaning, ellipsometry and reflectometry, photothermal AFM-IR, and photomask repair.
We invite you to connect with our experts on the expo floor and at our talks. Our team is excited to answer your questions, discuss your applications, and help you discover how Bruker’s advanced solutions can drive your research. See you there!
Conference Host:
SPIE
Conference Venue:
San Jose McEnery Convention Center | San Jose, CA
Exhibitor Presentations
Generative adversarial autoencoder for denoising in x-ray critical dimension metrology
Date: 25 February 2026
Time: 5:30 PM - 7:00 PM PST
Location: Convention Center, Hall 2
Adaptive critical dimension parameter evaluation in x-ray metrology with machine learning
Date: 25 February 2026
Time: 5:30 PM - 7:00 PM PST
Location: Convention Center, Hall 2
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If you would like to connect with a Bruker representative immediately, here are our regional offices:
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