The Dimension HPI system utilizes an open-access platform, large– or multiple-sample holders, and numerous ease-of-use features to provide the most flexible high performance nanoscale metrology solution for industrial QA, QC, and FA applications. HPI features:
- Automated 2-inch to 12-inch wafer measurements for semi, data storage and HB-LED
- A reliable, proven platform specifically designed for use in industrial environments
- Microscope provides increased XY sample travel for full access to 200mm wafers or multiple samples in 200-mm diameter area (Optional Chucks for 300-mm wafers)
- High-throughput 5-10x FastScan scanner for topography, roughness and other metrology analyses
- Icon scanner with 90µm scan range for larger scans and high accuracy topography performance
- Optical and AFM image pattern recognition with tip-centering to achieve nanometer alignment