The Dimension HPI system utilizes an open-access platform, large– or multiple-sample holders, and numerous ease-of-use features to provide the most flexible high performance nanoscale metrology solution for industrial QA, QC, and FA applications. HPI features:

• Automated 2-inch to 12-inch wafer measurements for semi, data storage and HB-LED
• A reliable, proven platform specifically designed for use in industrial environments
• Microscope provides increased XY sample travel for full access to 200mm wafers or multiple samples in 200-mm diameter area (Optional Chucks for 300-mm wafers)
• High-throughput 5-10x FastScan scanner for topography, roughness and other metrology analyses
• Icon scanner with 90µm scan range for larger scans and high accuracy topography performance
• Optical and AFM image pattern recognition with tip-centering to achieve nanometer alignment

New AutoMET™ full-recipe software delivers fast, automated metrology, simple operation, and AFM adaptability for easy capture of critical-to-quality measurements needed in production.

• Automated measurements  on multiple samples or a single large sample for nanoscale characterization across multiple locations
• Optical and AFM image pattern recognition, tip-centering, full wafer or grid mapping support, and image-placement accuracy within tens of nanometers
• Comprehensive yet simple recipe writing for the advanced user or engineer available for real-time and offline use
• Easy setup to align sample to probe and alignment corrections to AFM environment