Rhazer-III
Rhazer III
The Bruker Rhazer-III® system is specially designed for the wafer fab to provide an in-fab haze removal and management capability. Rhazer technology is clean and dry.
Photo-Induced Defect Management (Haze Mitigation)
Photo-induced micro-contamination on photomasks (haze) has become an increasingly pervasive and costly problem throughout the semiconductor industry. Recent wet clean and environmental control techniques have helped to slow haze formation during wafer stepper exposures, but show no promise of a haze prevention solution. The Bruker Rhazer-III® system is specially designed for the wafer fab to provide an in-fab haze removal and management capability. Rhazer technology is clean and dry. Processing the mask does not require removal of the pellicle and causes no damage to the mask absorber materials and no changes to phase, transmission or CDs, meaning reticles can be cleaned as often as needed without leaving the control of the fab line.
Key Performance Features
Increased Lithography Line Efficiency:
- Dry process - no pellicle removal
- Fast turnaround - full reticle clean
- Full control - retcles never leave the wafer fab
- Fewer cleans - no haze formation in storage
Fully Automated Operation:
- SMIF & Overhead Track compatible; RFID/OCR/Barcode readers
- SECS/GEM compatible
- Robotic handling including mask flipper
- Easy to operate; highly user friendly GUI
Extends Mask Lifetime:
- No absorber damage
- No CD, phase or transmission variance
- No added chemical residues
- No limit to number of cleans
Wafer Fab Cost Savings:
- Less wasted scanner downtime waiting for masks
- Very low cost mask cleans
- Fewer duplicate masks needed
- Extended interval between defect inspections
- Reduced haze-related wafer losses
- Low energy consumption (7kW @ 208V AC)
- Small system footprint (1.24m x 2.31m)
Dry, Chemical-Free Technology:
- No acids, solvents or de-ionized water
- No harmful effluents or waste management
Results
How Can We Help?
Service and Application Support to Optimize Tool Utilization
The decision to invest in high-performance metrology is based on more than instrument performance and price. Bruker is committed to keeping your tool running at the peak of up-time and productivity. We have a highly educated worldwide team of service and support personnel that takes great pride in first-time solution of issues. Our variety of service coverage programs can be customized to match your specific requirements, including optimization of tool performance, recipe writing, and in-person technical support visits.
Bruker tailors services to your needs:
- Priority technical support
- Advance replacement parts and assemblies stored in regional warehouses for rapid response times
- Application and training services