V E R T E X70v

The VERTEX 70v vacuum spectrometer perfectly fits the needs for research applications where high sensitivity, stability and temporal resolution are required. The available spectral range down to the FIR/THz region enables additionally specific applications for industrial research. The versatile VERTEX 70v system provides combined with suitable accessories and the use of the appropriate measurement technique a solution for almost every demand in the field of FTIR spectroscopy.

Research & Development

  • Continuous and Step Scan technology for time-resolved as well as amplitude (AM) and phase modulation (PM) spectroscopy (Step Scan / Rapid Scan / Interleaved TRS)
  • FT-IR spectroscopy in ultrahigh vacuum
  • FT-IR spectroelectrochemistry for the in-situ investigation of electrode surfaces and electrolytes
  • Investigation of proteins in water (CONFOCHECK)
  • Determination of the absolute configuration of molecules (VCD)

Pharma

  • Characterization of stability and volatile content of medical drug products by thermal analysis (TGA-FT-IR)
  • Differentiation of polymorphs of active pharmaceutical ingredients in the far infrared region (Bruker FM)

 

 

Polymers and Chemistry

  • Identification of inorganic fillers in polymer composites in the far infrared region (Bruker FM)
  • Dynamic and rheo-optical studies of polymers
  • Determination of volatile compounds and characterization of decomposition processes by thermal analysis (TGA-FTIR)
  • Reaction monitoring and reaction control (MIR fiber probe)
  • Identification of inorganic minerals and pigments

Surface Analysis

  • Detection and characterization of thin and monolayers
  • Surface analysis combined with polarization modulation (PM-IRRAS)

Material Science

  • Characterization of optical and highly reflective materials (windows, mirrors)
  • Investigation of dark materials and depth profiling by Photo-Acoustic Spectroscopy (PAS)
  • Characterization of the emittance behavior of materials

Semiconductors

  • Determination of oxygen and carbon contents in silicon wafers for quality control