Cryogenic CO2 Cleaning

Provides Unique Solutions

Extremely fast and environmentally friendly, Bruker's dry Cryogenic CO2 cleaning technology offers unique advantages over conventional cleaning techniques. The Bruker technology is cost effective, non-destructive, waste & residue free, and eliminates corrosion/staining, Our customers benefit from many standard features, including:

  • Superior cleaning performance using our patented nozzle design
  • 24/7 proven production performance
  • High throughputs ensure high capital utilization
  • Increased yields that are not available with standard wet or plasma cleaning processes
  • Compact system design minimizes cleanroom space 
  • Low cost of ownership

With over 100 tools installed, Bruker provides Cryogenic CO2 process equipment for a broad range of applications in the following market segments:

  • MEMS
  • Solar
  • Photomask
  • Imaging Devices
  • Semiconductor
  • Compound Semiconductor
  • Thin Film Head
  • Flat Panel Display

As the leading innovator of dry CO2 technology, Bruker sets the standard for quality dry process cleaning. The company currently holds over 25 U.S. and International patents in many areas of cryogenic CO2 cleaning. This innovation has been the standard in production cryogenic CO2 cleaning for over 30 years.

Our state of the art applications lab provides a location where our customers can come to develop new cleaning techniques or optimize their existing processes. With our location in Delray Beach, FL, this laboratory is easily accessible to our global customer base.

To learn more about how Cryogenic CO2 cleaning technology can resolve your most difficult contamination problems, please contact us for more information or schedule a demonstration.

Learn about the WC2200.

CO2 Precision Cleaning