Robust, Production Gage Performance

In addition to the unmatched measurement and imaging capabilities of Bruker-exclusive interferometry technology, the ContourGT-X is equipped with a proprietary internal laser reference and customdesigned industrial cabinet for maximum stability and robustness. The system’s automation-ready configuration includes everything necessary for rapid optimization for almost any production environment, from an air table stabilizer kit for enhanced X, Y, Z wafer placement accuracy to optimization of PDU, EMO and vacuum systems for integration and modified vacuum chucks for autoloader end-effector compatibility.

Key Features

  • Unique metrology sensor design with patented dual-LED light source
  • Self-calibrating, metrology optimizing laser reference
  • Integral vibration-isolation floor-mount cabinet
  • Fully automated measurement capabilities (focus, intensity, tip/tilt head, staging, FOV)
  • Nanometer-scale resolution on high-contour surfaces
  • Streamlined, customizable production interface
  • Real-time automated measurement optimization
  • Extensive library of filters and customizable analysis options
ContourGT-X automated routine on wafer
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