X-ray Metrology, wafer

Thin film analysis using X-rays

X-ray Metrology is basically about thin film analysis using X-rays, whether it is the determination of (multi-)layer thickness and composition, density and roughness, or the lattice parameters and degree of strain in epitaxially grown films. Several, complementary techniques can be applied to obtain the data one is looking for.

Are you interested in getting to know more about the X-ray Metrology technologies? The links below give you information on the most important methods to characterize thin films with X-rays, such as HRXRD, µ-XRF and XRR.