D8-FABLINE, X-ray metrology solution

Every D8 FABLINE comes with

  • Full SEMI S2 and S8 compliance
  • Wafer handling from 100 mm to 300 mm
  • Horizontal sample mount for safe wafer handling and high sample throughput
  • Stress-free vacuum wafer chuck
  • Fan Filter Unit (FFU)
  • Integrated handling robot with a single or dual load port and pre-aligner
  • SECS/GEM interface for straightforward fab integration
  • ISO Class 2

The modularity of the tool allows optimization according to your applications.

High Resolution X-ray Diffraction

The D8 FABLINE for HRXRD applications has a vertical goniometer. The sample stage can be tilted up to 45° to enable the measurements of a range of reflections. Equipped with a high-flux sealed tube, third generation Göbel mirror, monochromator, automatic rotary absorber, analyzer and scintillation or Lynxeye detector, precise and fast analysis is obtained for blanket wafers. Several beampaths can be combined. The PATHFINDER takes care of the automatic switch between the different optics.

For ultraprecise HRXRD analysis on structured product wafers, a microfocus IµS tube with a spotsize down to 50 µm x 50 µm is offered in combination with a high resolution microscope camera and automatic pattern recognition.

Please also read more about the D8 DISCOVER - our advanced X-ray diffraction system for materials research applications.

X-ray Reflectivity

The D8 FABLINE for XRR applications has a vertical goniometer and is equipped with a high-flux sealed tube, third generation Göbel mirror, automatic rotary absorber and scintillation detector. High-precision plug-in slits, a knife-edge collimator and Soller slits can be added to tailor the configuration. It is possible add a µXRF module for combined XRR/µXRF analyses.

µ-X-ray Fluorescence

The D8 FABLINE for µXRF applications comes with a high brilliance microfocus Mo or Rh source with small spots down to 20 µm x 20 µm. The X-Flash detector offers highest count rate capability and an energy resolution better than 129 eV (at Mn Kα). This warrants optimum peak resolution and shortest measurement times. A laser height system sets the distance from the source to the sample surface with a precision better than 1 µm. A high resolution microscope camera with automatic pattern recognition assures that even the smallest pads are measured accurately. Fundamental parameter software allows calibrating the tool with a minimum of standards.

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