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Automated AFMs

Bruker’s automated AFMs provide proven industrial metrology solutions for surface roughness measurement, chemical mechanical planarization (CMP), and etch-depth measurements on the most current technology nodes and wafers. Dimension AFP is the world’s only metrology tool designed to measure both CMP and etch-depth, offering its users unmatched capabilities and precision. InSight-450 3DAFM is a one-tool metrology solution for non-destructive roughness characterization, thin-film and epitaxial deposition, etch depth, in-line resist profiling, and much more. All Bruker automated AFMs combine the repeatability of automation and the flexibility of multiple mode imaging with the precision of high-resolution AFM metrology.    

Industrial AFM Insight 450 v1

InSight-450 3DAFM

Atomic Resolution for 450mm Wafers

Automated AFM dimnension AFP v1

Dimension AFP

Automated Chemical Mechanical Planarization and Etch Metrology at 65nm

Insight AFP tool image v1

InSight CAP

Compact Atomic Force Profiling for Production-Based Depth Metrology