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Failure Analysis and Materials Characterization

Failure analysis and materials characterization groups within industrial companies are focused on solving problems to help improve process development and resolve process related problems to help their organization saves costs and increase revenue.

The nanoIR3-s provides a complete nanoscale FTIR, nanoscale chemical imaging and materials characterization platform. It combines two complementary nanoscale IR techniques, AFM-IR and scattering SNOM coupled with AFM based materials property mapping. The nanoIR platforms is productive and reliable, getting you productive within a day. Applications include:

  • Nano-organic contaminants
  • LowK dielectrics
  • Semiconductor materials
  • Data storage media and slide


Webinar: Nanoscale AFM-IR Spectroscopy and Imaging for Failure Analysis of Electronic Devices

Watch On-Demand

Organic nano-contaminants are a serious defectivity issue for semiconductor and data storage companies where current characterization techniques have limited capabilities. This note describes the application of the nanoIR3 to the measurement of such defects and other semiconductor materials. The nanoIR3 system is based on a scientific breakthrough technique of acquiring IR spectra at spatial resolutions down to 10 nm, enabling researchers to obtain nanoscale chemical fingerprints of their material.

The spectra generated using Anasys Instruments’ patented AFM-IR™ technique directly correlates with traditional FTIR spectra, and are thus comparable to standard FTIR libraries. In addition to chemical analysis, the nanoIR3 provides complementary mechanical, electrical, thermal, and structural property information with nanoscale spatial resolution.

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