Transmission Kikuchi Diffraction in the Scanning Electron Microscope

A new high-resolution EBSD technique

Low kV EBSD Orientation Map of a Si Thin Layer
Low kV EBSD orientation map of a fine-grained Si thin film, step size 30 nm
TKD Orientation Map of a Si Thin Layer
Transmission Kikuchi Diffraction orientation map of an ultra fine-grained Si thin layer, step size 11 nm

A spatial resolution improvement of up to one order of magnitude for Electron Backscatter Diffraction (EBSD) results can be achieved with the Transmission Kikuchi Diffraction (TKD) technique. TKD uses existing EBSD hardware but requires software adaptations and electron transparent samples, e.g. TEM lamella, free standing films and crystalline nanoparticles.

Recognizing the potential of this new technique Bruker integrated it into the QUANTAX EBSD system. The TKD mode in QUANTAX EBSD is designed to be user friendly and allow the acquisition of high quality data regardless of the users’ experience level. TKD analyses with QUANTAX EBSD can also be combined with EDS analyses thanks to a special sample holder designed by Bruker.

Special guest of this free 1 hour webinar (Session II) will be Robert Keller, Ph.D. from the National Institute of Standards and Technology (NIST) in Boulder CO, USA. He is co-author of the first peer reviewed paper introducing the TKD method in a SEM. Focusing on advantages in comparison to the conventional method of EBSD orientation mapping, the most important details of the new method will be explained during the webinar using application examples.

Who should attend?

  • Researchers working in electron microscopy labs studying nanocrystalline or ultrafine grained materials
  • Materials and earth science lecturers and students
  • EBSD users interested in advanced applications of the method

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