QC5-R
QC5-R
The next-gen QC5-R semiconductor metrology system provides automated high-resolution X-ray diffraction (HRXRD) and X-ray reflectivity (XRR) characterization for manually loaded wafers. This system enables rapid, precise measurements of epilayers with automatic technique switching between HRXRD and XRR, as well as automated parameter calculations and reporting with Bruker’s industry-leading RADS and REFS software. From streamlined measurements to comprehensive analyses, QC5-R is a high-precision instrument delivering reliable control over epilayer thickness and composition for process optimization.
Precision Metrology for Epilayer Quality Control
QC5-R provides automated epilayer measurements for manually loaded wafers, delivering detailed information on properties, including composition, thickness, and uniformity.
QC5-R provides:
- High-throughput X-ray metrology for compound semiconductor manufacturing.
- Automatic switching between HRXRD and XRR for complex epitaxial structures.
- Industry-leading simulation software for reliable analyses and automatic data reporting.
High-Throughput, Reliable Performance
QC5-R’s reliable metrology data is automatically analyzed and reported using Bruker’s industry-leading data analysis software. Essential features are integrated, including batch fitting functionality for offline data analysis, automated wafer reports with pass/fail criteria, and automatic reporting.
By providing fast feedback on epilayer quality, QC5-R allows for rapid adjustments to the manufacturing process, maintaining high quality standards and improving overall yield.
