nm-VI
Precision Repair of Advanced, Critical-Level Photomasks
Bruker’s AFM nanomachining systems are the global standard and preferred production technique for precision repair of advanced, critical-level photomasks. The nm-VI® system is Bruker’s sixth generation AFM-Guided Nanomachine. The nm-VI sets Bruker apart as the company that can develop and deliver the innovative nano-scale material shaping processes required to keep the semiconductor industry in concert with the 5 nanometer technology node and beyond.
Industry Leading Mask Repair Method
Nanomachining is a unique defect repair technique in the semiconductor industry, combining the positional control of an AFM and proprietary Nanomachining hardware and software to perform material removal at nanometer levels.
Its appeal lies in the precise and accurate removal of defects of various materials including chrome, MoSi, opaque MoSi, silicon nitride, quartz, EUV, foreign materials, and unknown particles. Its iterative repair capability and planar material removal guarantees repaired areas with a much wider “Through Focus” transmission window.
Addressing Industry's Critical Challenges
With six generations and nearly 20 years of inline experience, Bruker's AFM-guided nanomachine boasts unique optimizations and enhancements to control pattern defects in the production of high-end photomasks with decreasing feature size and increasing mask complexity. Notable features include:
- Standard BitClean® Function – Special hardware and software automation that provides final pre-pellicle local clean capability using the nanomachining tip for the removal of persistent unknown particle contamination.
- Integrated local pattern copy functions come standard with the system.
- Design Image Retrieval Package (optional) includes computer hardware and nm-VI system interface software. It provides the capability to retrieve segments of mask repair area pattern images from original design files, correct for AFM scanned image, display and overlay on the designated repair area for operator executed repair.
A Technique with Minimal Trade-Offs
The nm-VI offers production proven nanomachining with few downsides. The AFM-based nanomachining technique boasts the following over other (focused ion beam (FIB) and laser or electron beam) mask repair systems.
- no vacuum requirement
- no chemistries
- no chemical residues
- no beam related charging effects
- no need for constant drift correction by re-registration to undesirable positioning markers
How Can We Help?
Service and Application Support to Optimize Tool Utilization
The decision to invest in high-performance metrology is based on more than instrument performance and price. Bruker is committed to keeping your tool running at the peak of up-time and productivity. We have a highly educated worldwide team of service and support personnel that takes great pride in first-time solution of issues. Our variety of service coverage programs can be customized to match your specific requirements, including optimization of tool performance, recipe writing, and in-person technical support visits.
Bruker tailors services to your needs:
- Priority technical support
- Advance replacement parts and assemblies stored in regional warehouses for rapid response times
- Application and training services