Ellipsometers and Reflectometers

FilmTek SE

A streamlined option for precise, repeatable spectroscopic ellipsometry

Highlights

FilmTek SE

The base model of our "SE" product line, the FilmTek™ SE automated benchtop spectroscopic ellipsometer offers users a streamlined option for quickly and easily collecting highly precise, repeatable measurements on a range of thin and ultra-thin film samples.

 

This system enables fast, accurate, uncomplicated measurement of film thickness, refractive index, and extinction coefficient with a measurable thickness range of <1 Å to 50 µm. It is capable of measuring almost any optically homogenous, translucent single-layer or small multilayer film within this range. Based on an advanced rotating compensator design, this system delivers optimal measurement performance on virtually all such film samples, even those deposited on silicon or glass substrates.

 

This budget-friendly ellipsometer is ideally suited for use in academic and R&D settings, particularly for investigating the thickness and uniformity of ultra-thin films (with 0.03 Å repeatability on native oxide).

Best value
base platform
Provides high-performance film metrology for a broad range of samples at low cost.
Streamlined
standard configuration
Achieves best-in-class speed and accuracy without add-ons or modules.
Easy-to-use
system and software
Ensure users of any experience level can collect the highest quality ellipsometric data.
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Features

Features

Measurement Capabilities

Enables simultaneous determination of:

  • Multiple layer thicknesses
  • Indices of refraction [ n(λ) ]
  • Extinction (absorption) coefficients [ k(λ) ]
  • Energy band gap [ Eg ]

System Components

Standard:

  • Spectroscopic ellipsometry with rotating compensator design (390nm-950nm)
  • Automated stage with autofocus
  • Ideal for measuring ultra-thin films (0.03 Å repeatability on native oxide)
  • Affordable for nearly any budget
  • Advanced material modeling software
  • Bruker's generalized material model with advanced global optimization algorithms

Applications

Applications

Typical Application Areas

Virtually all translucent films ranging in thickness from less than 100 Å to approximately 50 µm can be measured with high precision. Typical application areas include:

  • Semiconductor and dielectric materials
  • Multilayer optical coatings
  • Optical antireflection coatings
  • Thin metals
  • Solar cells

With flexible hardware and software that can be easily modified to satisfy unique customer requirements, particularly in academic and R&D environments.

Specifications

Technical Specifications

Film Thickness Range 0 Å to 50 µm
Film Thickness Accuracy ±1.0 Å for NIST traceable standard oxide 100 Å to 1 µm
Spectral Range 380 nm - 950 nm
Measurement Spot Size 3 mm
Sample Size 2 mm - 300 mm (150 mm standard)
Spectral Resolution 0.3 nm
Light Source Regulated halogen lamp (10,000 hrs lifetime)
Detector Type 2048 pixel Sony linear CCD array
Computer Multi-core processor with Windows™ 10 Operating System
Measurement Time ~2 sec per site (e.g., oxide film)

Performance Specifications

Film(s) Thickness Measured Parameters Precision ()
Oxide / Si 0 - 1000 Å t 0.03 Å
1000 - 500,000 Å t 0.005%
1000 Å t , n 0.2 Å / 0.0001
15,000 Å t , n 0.5 Å / 0.0001
150.000 Å t , n 1.5 Å / 0.00001
Nitride / Si 200 - 10,000 Å t 0.02%
500 - 10,000 Å t , n 0.05% / 0.0005
Photoresist / Si 200 - 10,000 Å t 0.02%
500 - 10,000 Å t , n 0.05% / 0.0002
Polysilicon / Oxide / Si 200 - 10,000 Å Poly , t Oxide 0.2 Å / 0.1 Å
500 - 10,000 Å Poly , t Oxide 0.2 Å / 0.0005

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