Surface Characterization of Semiconductor Materials and Devices

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High-Resolution Topography

• [00:03:27] Principles of AFM
  
• [00:05:46] Surface topography imaging
  
• [00:08:15] Dimensional metrology
  
• [00:10:32] Automated measurements
  
• [00:12:31] Practical demonstration
  

Beyond Topography

• [00:20:14] Nano-electrical
  
• [00:23:00] Nano-mechanical

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• [00:01:25] Introduction
• [00:03:03] Photothermal AFM-IR overview

• [00:04:33] Process induced defects in interconnect structures
• [00:07:50] Organic nano-contaminants
• [00:09:50] How to identify an unknown sample
• [00:11:06] Demonstration
• [00:18:30] Inorganic nano-contaminants
• [00:19:31] Summary
• [00:20:03] Q&A

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• [00:00:00] Introduction
• [00:02:45] Hysitron product basics
• [00:04:15] Nanoindentation explained
• [00:05:52] Mechanics of CU pads and Sn solders
• [00:10:24] Accelerated property mapping
• [00:14:21] Process monitoring: Ultra low-k mechanics
• [00:21:14] Advanced testing
• [00:22:40] Q&A

_{PRESENTATION HIGHLIGHTS:}

Stylus profilometry

• [00:01:43] Introduction to stylus profilometry
• [00:07:42] Semiconductor and microelectronics applications
• [00:08:26] Vision64 software demonstration

Optical profilometry

• [00:12:00] Introduction to optical profilometry
• [00:16:49] Semiconductor applications
• [00:21:56] Vision64 software demonstration
• [00:26:40] Summary

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• [00:02:30] Introduction
• [00:09:56] Instrumentation and process parameters
• [00:14:10] Practical applications and experiments
• [00:34:40] Summary

       _{PRESENTATION HIGHLIGHTS:}

• [00:01:44] Introduction
• [00:03:06] Chemical mechanical planarization
• [00:12:26] Demonstration: fully automated AFM profiling
• [00:19:58] Defectivity
• [00:29:19] Automation
• [00:30:36] Summary