SEMICON WEST 2020

Bruker at SEMICON WEST 2020

A New and Exciting Online Event!

Join us online from the comfort of your home or work office using any mode of connection through your laptop, desktop, tablet, or mobile device. Participate in a full exhibition experience, featuring all the content, high-level keynotes, exhibits, and networking opportunities of a physical show — minus the travel.

View Bruker's solutions for:
Defect Review & Contamination | Metrology: Gate, Thin Film, Depth
Photomask Repair | CMP & BEOL
 

SEMICON WEST 2020     CONTACT US

SEMICON WEST - Free Expo Pass

Visit Our Virtual Booth to Learn about Bruker Solutions for:

Defect Review & Contamination

JVSensus

JVSensus-600F

XRDI Inspection System for Crystaline Defects in Patterned and Blanket Wafers

JVX7300F-C

JVX7300F-C

Total Reflection X-ray Fluorescence TXRF

JV-QCTT

JV-QCTT

X-ray Defect Detection for Wafer and Ingot Slices

Dimension FastScan Pro

FastScan Pro

Automated Nanometrology and Characterization

 

 


Metrology: Gate, Thin Film, Depth

JV-QCVelox

QCVelox-E

High Performance HRXRD for Epilayer Quality Control of GaN LED and III-V Materials

JVX7300LSI

JVX7300LSI

In-fab R&D and In-line Production Process Monitoring

JV-DX

JV-DX

X-ray Metrology System for the Analysis of Thin Films

InSight CAP

InSight CAP

Compact Atomic Force Profiling for Production-based Depth Metrology

Sirius-RF

Sirius-RF

Multi Channel Metrology for Measurement of Thin Metal Films

Sirius-FW

Sirius-FW

Process Control of Bump and Under-bump Metal in Advanced Wafer Packaging

Hysitron TI 980

TI 980 TriboIndenter

World's Most Advanced Nanomechanical and Nanotribological Test Instrument


Photomask Repair

RAVE nm-VI

RAVE nm-VI

5nm Production Nanomachining Photomask Repair System

 

 

RAVE fp-III

RAVE fp-III

45nm Production Laser Photomask Repair System

 

 

RAVE EL-C

RAVE EL-C

CO2 Cryogenic Production Photomask Dry Cleaning System

 

 

WaferClean 2200

WaferClean 2200

CO2 Cryogenic Production Wafer Dry Cleaning System


CMP & BEOL

InSight WLI

InSight WLI

Automated, Gage-Capable Metrology with 300mm Wafer Handler for R&D and Production

Insight AFP tool image v1

InSight AFP

Fully Automated, Atomic-level Force Control for CMP Wafers

TriboLab CMP

TriboLab CMP

R&D-scale Process and Material Characterization System

ContourGT-X

ContourGT-X

Fully Automated Gauge-capable Optical Profiler with Production Interface