Beyond Traditional Ellipsometry: High-Accuracy Thin Film and Multilayer Metrology
High-accuracy thin film and multilayer metrology using combined reflectometry and spectroscopic ellipsometry
Tuesday, October 27 | 9AM PDT | 12PM EDT | 5PM CET
Combining Reflectometry and Ellipsometry for High-Accuracy Optical Metrology
This webinar will introduce the principles behind Bruker’s Filmtek spectroscopic reflectometer/ellipsometers and explore how modern optical metrology approaches can overcome many of the limitations associated with conventional single-technique measurements.
Attendees will discover:
- How Filmtek systems independently determine thickness, refractive index (n), and extinction coefficient (k) across a wide range of materials and structures
- How patented DPSD and MADP technologies and complementary optical data help overcome the limits of conventional single-technique measurements
- Why independent determination of thickness and refractive index is essential for complex multilayer stacks and other challenging applications
Tuesday, October 27 | 9AM PDT | 12PM EDT | 5PM CET
Webinar Summary
Accurate characterization of thin films and complex multilayer stacks is increasingly critical in semiconductor manufacturing, specifically: photonics, MEMS, advanced packaging, optical coatings, and emerging materials research. This webinar provides an introduction to the unique principles of the Bruker Filmtek spectroscopic reflectometer/ellipsometers, while exploring how modern optical metrology approaches can overcome many of the limitations associated with conventional single-technique measurements.
Attendees will learn how the Filmtek systems combine multi-angle reflectometry and spectroscopic ellipsometry to independently determine film thickness, refractive index (n), and extinction coefficient (k) across a wide range of materials and structures. The presentation will cover the underlying measurement physics, patented Multi-Angle Differential Power Spectral Density (DPSD) and Multi-Angle Differential Polarimetry (MADP) technologies, and the advantages of collecting complementary optical data from the same measurement location.
Real-world application examples will illustrate measurement performance on semiconductor, dielectric, photonic, and multilayer structures ranging from ultra-thin films to complex stacks. Participants will gain practical insight into obtaining accurate thickness and optical constant measurements, improving process control, and addressing challenging applications where independent determination of thickness and refractive index is essential.
Date: October 27, 2026
Time: 9AM PDT | 12PM EDT | 5PM CET
Location: Online
Featured Technologies:
Contact:
Find out more about the technology featured in this webinar or our other ellipsometry and refractometry solutions:
Speaker
Lawrence Rooney, Senior Application Scientist, Bruker
