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Challenges in Thin Film Hardness, Modulus Measurement and Solutions

Thin Film Measurements Webinar Series Part 1/4. Presented by Pal-Jen Wei, Ph.D., Applications Scientist, Bruker

In this first session of our four-part Thin Film Characterization Webinar Series, viewers learn how instrumented indentation solves the challenges of measuring the mechanical properties of thin films at the nano-scale—and how Bruker's solutions for instrumented nanoindentation provide unmatched imaging and metrology performance.

Challenges In Thin Film Hardness, Modulus Measurement And Solutions

Presented by PJ Wei, Ph.D., Applications Scientist, Bruker (August 12, 2021)

       PRESENTATION HIGHLIGHTS

  • [00:03:06] Introduction to mechanical properties of thin films and related metrology methods
  • [00:06:07] Overview of instrumented indentation for testing nano-scale properties of thin films
  • [00:11:32] Challenges of profiling the intrinsic mechanical properties of ultra-thin films
  • [00:19:55] Solutions for characterizing the intrinsic mechanical properties of ultra-thin films
  • [00:28:36] Bruker's solutions for nano-to-macro scale measurement of thin films and coatings

Q&A


       LIVE Q&A WITH THE PRESENTER

  • [00:35:30] Is there any relationship between the elasticity and plasticity of the sample?
  • [00:40:10] For SPM mode, are there any differences if the probe tip is indented in the same position or a different position?
  • [00:42:26] What technique/tool can be used to measure wafer-to-wafer bonding samples?
  • [00:45:05] What sample thickness range can be checked using TEM and SEM?
  • [00:49:50] Why plot displacement on the X-axis?
  • [00:54:08] What is the sample thickness limit when measuring hardness?