Atomic Force Microscope Webinars

Characterization of Thin Dielectric Films with Atomic Force Microscopy (AFM)

Learn how AFM can be applied to measure and quantify the properties of dielectric film.

Learn how AFM can be applied to measure and quantify the properties of dielectric film.

This webinar focuses on the various possibilities offered by Bruker AFM modes to measure and quantify the properties of dielectric films. Each method is illustrated with case studies, and two short live demonstrations were held on a Bruker Dimension Icon to portray the practical implementation and operation of two of the electrical characterization modes.

Investigate Characterization of Thin Dielectric Thin Films with AFM

The properties of dielectric materials play a crucial role in their suitability for a range of high-performance applications in the semiconductor and microelectronic industries, and as insulation and packaging materials.

In this webinar, the presenters illustrate how AFM can be applied to measure and quantify the properties of dielectric films using:

  • Nanometer-scale topography mapping and accurate measurement of roughness and step height. Practical aspects, such as tip and mode selection and how to overcome ESD effects, are addressed.
  • Conductive AFM (C-AFM) and Tunneling-AFM (TUNA): Nanoscale electrical characterization can be applied to study tunnel currents through dielectrics by current imaging and current-voltage point spectroscopy. These data provide insight into dielectric properties such as film thickness uniformity, the presence of defects, and breakdown behavior (reversible & irreversible). The method also extends to time-dependent breakdown measurements.
  • Electric field Microscopy (EFM) and Kelvin Probe Force Microscopy (KPFM): Study charge distribution and capacitance related effects.
  • Scanning Microwave Impedance Microscopy (sMIM): The tip/sample capacitance is measured with high spatial resolution and sensitivity to study variations in the dielectric thickness and dielectric constant. The capacitance imaging capability is augmented with C-V spectroscopy capability, providing further insights into the local dielectric properties.

Each method was illustrated with case studies, and two short live demonstrations were held on a Bruker Dimension Icon to illustrate the practical implementation and operation of two of the electrical characterization modes.

 

Find out more about the technology featured in this webinar or our other solutions for AFM:

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Speaker(s)

Peter De Wolf, Ph.D., Director of Technology & Application Development

Peter De Wolf received his Ph.D in Electrical Engineering from the University Leuven, Belgium in 1998. His PhD work focused on the development of SPM based electrical characterization methods for semiconductors at IMEC in Belgium. He is co-inventor of several SPM methods & holder of several patents. Since 1998, Peter De Wolf works at Bruker (formerly Digital Instruments & Veeco Instruments) in both Santa Barbara, USA and Paris, France. At Bruker he held positions as R&D engineer and application development scientist.

Mickael Febvre, Ph.D.
Application Manager, Bruker EMEA

Andrea Slade, Ph.D., Product Manager, Materials AFM, Bruker Nano Surfaces & Metrology