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Ellipsometers and Reflectometers
Ellipsometry & Reflectometry Resource Library
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Featured Products and Technology
Multi-Angle Reflectometry/Ellipsometry Systems
Industry-leading measurement performance for challenging ultra-thin to thin films and multilayers with 100x performance advantage over other non-contact methods
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Spectroscopic Reflectometry
Expedited film thickness and optical constant measurements well suited for in-situ production quality assessment, particularly on thick films in development and production environments and semiconductor wafers
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Spectroscopic Ellipsometry
Highly sensitive, repeatable measurement of single-layer thin films and small multilayer structures, capable of characterizing thickness and optical properties even on layers less than a single atomic layer thick
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Reflection-Transmission Spectrophotometry
Fully integrated systems combining reflection, transmission, and optional ellipsometric and polarimetry data for measuring absorbing films deposited on transparent substrates
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Ellipsometry and Reflectometry Systems
Specialized thin film metrology systems for wafer and CD metrology, designed to meet requirements not measurable with conventional equipment
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