Electronic devices are getting smaller and more efficient, and thus require higher quality in the inspection of semiconductor microfabrication processes. Current technology features component structures (e.g., trenches, lines, and gratings) that measure down to a couple of hundred nanometers. This scale excludes the use of optical microscopes due to the light diffraction limit. However, atomic force microscopy (AFM) can provide nanometer accuracy in x, y, and z directions without damaging components and, therefore, is a very useful tool for characterizing these structures.
In this workshop, Bruker applications experts Senli Guo, Ph.D. (Sales Applications Engineer, Bruker) and John Thornton (Engineer Sr. Applications, Bruker) discuss and demonstrate:
The workshop concludes with a real-time demonstration showing how to measure a patterned sample and an expert-led Q&A session with the live workshop audience.
Find out more about the technology featured in this webinar or our other solutions for surface measurement:
Senli Guo, Ph.D., Application Scientist, Bruker
Senior Application Scientist, Bruker