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▶ Watch On-Demand | 1 Hr 30 Minutes

On-Demand Session: Accelerating Front-end Semiconductor Process Control With Accurate Metrology And Characterization

Discover how Bruker's solutions could fit your process control needs

Watch Individual Segments:

Introduction; Recorded  March 15, 2023
Watch Now | 20 Minutes

AFM for Front End Semi Process Control

Presented by Peter De Wolf, Ph.D., Worldwide Application Director, Bruker (March 15, 2023)

       PRESENTATION HIGHLIGHTS:

  • [00:00:36] Introduction to AFM
  • [00:04:47] Imaging the surface topography of semiconductor materials
  • [00:11:35] Measuring more than just topography
    •   [00:12:08] Nanomechanical characterization
    •   [00:15:04] Nano-electrical characterization
    •   [00:17:15] Nano-chemical identification
     
Watch Now | 20 Minutes

AAFM for Front-End Semi Process Control and Yield Management

Presented by Ingo Schmitz, Ph.D., Technical Marketing Engineer, Bruker (March 15, 2023)

       PRESENTATION HIGHLIGHTS:

  • [00:00:38] Bruker's high-performance AAFM instrumentation
  • [00:04:37] Principles of 3D AFM metrology
  • [00:05:32] Specialized modes for sidewall measurements
  • [00:09:26] 3D profiling and large area scanning
  • [00:12:34] Automated defect review and classification
  • [00:17:05] AFM-based photo mask repair
  • [00:18:50] Key features of the Insight AFP
     
Watch Now | 13 Minutes

WLI Optical Profiler for Front-End Semi Process Control

Presented by Samuel Lesko, Ph.D., Director of Technology and Apps Development, Bruker (March 15, 2023)

       PRESENTATION HIGHLIGHTS:

  • [00:00:28] Overview of white light interferometry
  • [00:02:03] WLI imaging range
  • [00:03:30] WLI hardware and instrumentation
  • [00:04:33] WLI applications from lab to fab:
    •   [00:06:30] Post-CMP qualification
    •   [00:09:34] Defect review of hybrid bonding
  • [00:12:09] Conclusion/review
     
Watch Now | 14 Minutes

Optical Metrology for Front-End Semi Process Control

Presented by Christopher Claypool, Senior R&D Director, for filmtek Products, Bruker (March 15, 2023)

       PRESENTATION HIGHLIGHTS:

  • [00:00:10] Introduction to spectroscopic ellipsometry and reflectometry
  • [00:02:30] FilmTek 2000 PAR-SE - Technology for thin-film and multi-layer inspection on silicon and specialty devices
    •   [00:06:53] Thin films and multilayers on patterned device wafers
  • [00:07:14] FilmTek 2000M TSV - Technology for thick film measurement for:
    •   [00:09:45] High aspect ratio TSV structures
    •   [00:11:10] Trench depth
    •   [00:11:42] Film thickness
  • [00:12:17] Unique advantages of Bruker's FilmTek technology
     
Watch Now | 14 Minutes

X-ray Metrology for Front-End Semi Process Control

Presented by Juliette van der Meer, Ph.D.,Product Marketing Manager for Semiconductor Solutions, Bruker (March 15, 2023)

       PRESENTATION HIGHLIGHTS:

  • [00:00:35] X-ray metrology solutions to front-end semiconductor manufacturing challenges
  • [00:01:53] X-ray diffraction (XRD) and (HR)XRD
  • [00:03:14] X-ray reflectometry (XRR)
  • [00:04:00] X-ray diffraction imaging (XRDI)
  • [00:05:00] Application examples:
    •   [00:05:10] Substrate inspection 
    •   [00:07:31]     GaN/Si devices
    •   [00:08:54] SiGe/Si nanosheet characterization
    •   [00:10:16] Piezoelectric materials
  • [00:11:05] Advanced automation options
  • [00:13:01] Summary/conclusion

Watch Now | 4 Minutes

Q&A

Spectroscopic Ellipsometry and Reflectometry

  • [00:00:04] Are existing/currently available reference materials and calibration artifacts sufficient for all measurements?
  • [00:01:36] Is there a workaround to measure transparent samples with ellipsometry?

X-Ray Metrology

  • [00:01:05] Do the XRD techniques presented have XPS capabilities in order to detect variation of chemical composition?

Automated AFM

  • [00:02:15] How is AFM used to clean EUV masks?
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