Bruker
Продукты и решения Применения Услуги Новости и события О нас карьера
Пожалуйста, используйте как минимум 2 символа (в настоящее время вы используете 1 символ).

Languages

▶ Watch On-Demand | 1 Hr 30 Minutes

On-Demand Session: Accelerating Front-end Semiconductor Process Control With Accurate Metrology And Characterization

Discover how Bruker's solutions could fit your process control needs

Watch Individual Segments:

Вам необходимо принять файлы cookie, чтобы воспроизвести это видео.

Introduction; Recorded  March 15, 2023
Watch Now | 20 Minutes

AFM for Front End Semi Process Control

Вам необходимо принять файлы cookie, чтобы воспроизвести это видео.

Presented by Peter De Wolf, Ph.D., Worldwide Application Director, Bruker (March 15, 2023)

       PRESENTATION HIGHLIGHTS:

  • [00:00:36] Introduction to AFM
  • [00:04:47] Imaging the surface topography of semiconductor materials
  • [00:11:35] Measuring more than just topography
    •   [00:12:08] Nanomechanical characterization
    •   [00:15:04] Nano-electrical characterization
    •   [00:17:15] Nano-chemical identification
     
Watch Now | 20 Minutes

AAFM for Front-End Semi Process Control and Yield Management

Вам необходимо принять файлы cookie, чтобы воспроизвести это видео.

Presented by Ingo Schmitz, Ph.D., Technical Marketing Engineer, Bruker (March 15, 2023)

       PRESENTATION HIGHLIGHTS:

  • [00:00:38] Bruker's high-performance AAFM instrumentation
  • [00:04:37] Principles of 3D AFM metrology
  • [00:05:32] Specialized modes for sidewall measurements
  • [00:09:26] 3D profiling and large area scanning
  • [00:12:34] Automated defect review and classification
  • [00:17:05] AFM-based photo mask repair
  • [00:18:50] Key features of the Insight AFP
     
Watch Now | 13 Minutes

WLI Optical Profiler for Front-End Semi Process Control

Вам необходимо принять файлы cookie, чтобы воспроизвести это видео.

Presented by Samuel Lesko, Ph.D., Director of Technology and Apps Development, Bruker (March 15, 2023)

       PRESENTATION HIGHLIGHTS:

  • [00:00:28] Overview of white light interferometry
  • [00:02:03] WLI imaging range
  • [00:03:30] WLI hardware and instrumentation
  • [00:04:33] WLI applications from lab to fab:
    •   [00:06:30] Post-CMP qualification
    •   [00:09:34] Defect review of hybrid bonding
  • [00:12:09] Conclusion/review
     
Watch Now | 14 Minutes

Optical Metrology for Front-End Semi Process Control

Вам необходимо принять файлы cookie, чтобы воспроизвести это видео.

Presented by Christopher Claypool, Senior R&D Director, for filmtek Products, Bruker (March 15, 2023)

       PRESENTATION HIGHLIGHTS:

  • [00:00:10] Introduction to spectroscopic ellipsometry and reflectometry
  • [00:02:30] FilmTek 2000 PAR-SE - Technology for thin-film and multi-layer inspection on silicon and specialty devices
    •   [00:06:53] Thin films and multilayers on patterned device wafers
  • [00:07:14] FilmTek 2000M TSV - Technology for thick film measurement for:
    •   [00:09:45] High aspect ratio TSV structures
    •   [00:11:10] Trench depth
    •   [00:11:42] Film thickness
  • [00:12:17] Unique advantages of Bruker's FilmTek technology
     
Watch Now | 14 Minutes

X-ray Metrology for Front-End Semi Process Control

Вам необходимо принять файлы cookie, чтобы воспроизвести это видео.

Presented by Juliette van der Meer, Ph.D.,Product Marketing Manager for Semiconductor Solutions, Bruker (March 15, 2023)

       PRESENTATION HIGHLIGHTS:

  • [00:00:35] X-ray metrology solutions to front-end semiconductor manufacturing challenges
  • [00:01:53] X-ray diffraction (XRD) and (HR)XRD
  • [00:03:14] X-ray reflectometry (XRR)
  • [00:04:00] X-ray diffraction imaging (XRDI)
  • [00:05:00] Application examples:
    •   [00:05:10] Substrate inspection 
    •   [00:07:31]     GaN/Si devices
    •   [00:08:54] SiGe/Si nanosheet characterization
    •   [00:10:16] Piezoelectric materials
  • [00:11:05] Advanced automation options
  • [00:13:01] Summary/conclusion

Watch Now | 4 Minutes

Q&A

Вам необходимо принять файлы cookie, чтобы воспроизвести это видео.

Spectroscopic Ellipsometry and Reflectometry

  • [00:00:04] Are existing/currently available reference materials and calibration artifacts sufficient for all measurements?
  • [00:01:36] Is there a workaround to measure transparent samples with ellipsometry?

X-Ray Metrology

  • [00:01:05] Do the XRD techniques presented have XPS capabilities in order to detect variation of chemical composition?

Automated AFM

  • [00:02:15] How is AFM used to clean EUV masks?
Input value is invalid.

Contact Us

* Please fill out the mandatory fields.

Please enter your first name
Please enter your last name
Please enter your e-mail address
Please enter a valid phone number
Please enter your Company/Institution
Please select your Country
Please select your State
What technology are you most interested in?
What best describes your current interest?
Please add me to your email subscription list so I can receive webinar invitations, product announcements and events near me.
Please accept the Terms and Conditions

             Privacy Notice   Terms of Use