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Surface Characterization of Semiconductors: An Overview, from Topography to Advanced Physical Properties

Learn about Bruker’s high-performance metrology techniques for the nanometer-scale surface characterization of semiconductor materials and devices
Presented by Peter De Wolf, Ph.D., WW Applications Director, Bruker; Samuel Lesko, Ph.D., Technology and Applications Development Director, Bruker; Udo Volz, Ph.D., Applications Scientist, Bruker; Ude Hangen, Ph.D., Nanomechanical Instruments Applications Manager, Bruker; Vishal Panchal, Ph.D., Applications Scientist, Bruker; and Hartmut Stadler, Ph.D., Applications Scientist, Bruker (April 21, 2021)

       PRESENTATION HIGHLIGHTS:

  • [00:00:00] Introduction to Bruker's portfolio of solutions for semiconductor characterization
  • [00:07:22] Semiconductor M3D Metrology Using Optical and Stylus Profiling
  • [00:45:42] CMP Tribology
  • [01:03:43] Mechanical Characterization of Semiconductor Samples and Devices
  • [01:022:08] Highest Resolution 3D Metrology and Advanced Physical Property Characterization of Semiconductor Samples and Devices

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