TriboLab CMP
TriboLab CMP
Leveraging over 20 years of CMP characterization expertise with its predecessor product (Bruker CP-4), TriboLab CMP brings a complete set of capabilities to the industry-leading TriboLab platform. The resulting accuracy and measurement repeatability enables the highly effective qualification, inspection, and ongoing functionality testing required throughout the CMP process. TriboLab CMP is the only process development tool on the market that can provide a broad range of polishing pressure (0.05-50 psi), speeds (1 to 500 rpm), friction, acoustic emissions, and surface temperature measurements for accurate and complete characterization of CMP processes and consumables.
To learn more, continue reading, contact us, or see FAQs about this product.
Small R&D-Scale Specialty System for CMP
- Reproduces full-scale wafer polishing process conditions without downtime on production equipment
- Provides unmatched measurement repeatability and detail
- Allows testing on small coupons for substantial cost savings over whole-wafer testing
On-Board Diagnostics for Better Understanding of Polishing Processes
- Delivers more visibility into transient polishing properties than any other system on the market
- Collects data from the instant the substrate touches the pad and throughout the entire test
- Enables early-stage process development decisions through more complete, detailed data
Flexibility in Sample Type, Size, and Mounting Configurations
- Polishes any flat material, using virtually any conditioning disc, any slurry, and any pad
- Accommodates small coupons through whole 100 mm wafers with ease
- Accepts multiple sample mounts for flexibility
Frequently Asked Questions
TriboLab CMP accommodates small coupons up to 100 mm (4”) wafers. Multiple wafer head and mounting options are available.
Wafer head and platen speeds for the TriboLab CMP system can range from 1 to 500 rpm. Polishing load ranges vary between 0.07 to 90 psi based on wafer size and head. Download the system brochure for a full list of specifications.
Yes. The system is designed for reliable, flexible, and cost-effective benchtop characterization that closely aligns with full-scale CMP conditions.
TriboLab CMP can use virtually any industry-standard pad, slurry, and conditioning disc. It also supports a programmable two-pump slurry and rinse delivery system.
Yes. The platform supports a wide range of materials. Bruker can advise on process parameters and connect you with partners for material-specific recipes when needed.
The system can record load, friction, temperature, acoustic emissions, speeds, and pressures from first contact to the end of the test.
More About Bruker's Mechanical Testing and Tribology Technology
TriboLab platforms support standard rotary, reciprocating, block-on-ring, four-ball, scratch, and indentation tests. Common methods include ASTM G99, G133, G77, D4172, and C1624. Equivalent ISO methods can typically be addressed through the same hardware and scripting.
The exact scope of the included installation and operator training depends on region and contract. Confirm details with your Bruker representative.
All TriboLab systems are modular. You can select drives, force and torque sensors, environmental chambers for temperature and humidity, liquid and electrochemical options, and advanced sensors to meet your application needs. If you are not sure which modules meet your needs, our experts can help.
Bruker provides applications consulting, troubleshooting, and best practice guidance, along with optional service plans for ongoing support, maintenance, and training.
Contact us to arrange a demonstration or submit samples for an evaluation tailored to your test geometry and materials.