X-Ray Metrology for Compound Semiconductors

QCVelox-E

Optimum HRXRD performance for epilayer monitoring

System of choice for leading epi manufacturers

The essential tool for routine analysis of semiconductor substrates, epilayer structures and processed device wafers.

QCVELOX-E

The Bruker QCVelox-E is the system of choice for leading epi manufacturers to monitor their production lines. It is based on the industry standard QC3, with significant upgrades for throughput, reliability and ease of use. By using optimum X-ray source and optics technology, it couples high throughput with excellent repeatability to enable fast feedback of the layer quality and structure within a production environment.

High-Throughput
high-resolution XRD
Enables fast feedback on epilayer quality.
Automated
operation and data analysis
Aids productivity during routine analysis of semiconductor substrates, epilayer structures, and processed device wafers.
Optimized
X-ray source and optics technology
Balances resolution and intensity requirements for each application.
Features

Automated Operation

The QCVelox-E offers true automated operation, with straight-forward horizontal sample mounting, and fully automated alignment, measurements including full mapping without edge exclusion, and automated data analysis. An integrated barcode reader is fitted to aid productivity within a production environment.
 An optional robot handler is available for automated loading and measurement from cassette, along with options for SECS-GEM and other factory host systems.

The QCVelox-E is the essential tool for routine analysis of semiconductor substrates, epilayer structures and processed device wafers for all compound semiconductor materials.
 

Software

Powerful Software for Automated Analysis and Reporting

Leveraging extensive experience in semiconductor fabs, Bruker has developed robust and intuitive software suite for automated analysis and reporting, including:

  • RADS for analysis of HRXRD data and reporting of composition, thickness, relaxation
  • REFS for analysis of XRR data and reporting of thickness, density, roughness
  • PeakFitting for FWHM and multi-peak fitting for reporting of barrier composition in complex structures
  • PeakSplit for automated 2D fitting of reciprocal space maps and offline relaxation and tilt analysis
  • QuickGraph for offline data display and basic analysis
REFS software user interface during analysis of XRR data.
Support

How Can We Help?

Service and Application Support to Optimize Tool Utilization

The decision to invest in high-performance metrology is based on more than instrument performance and price. Bruker is committed to keeping your tool running at the peak of up-time and productivity. We have a highly educated worldwide team of service and support personnel that takes great pride in first-time solution of issues. Our variety of service coverage programs can be customized to match your specific requirements, including optimization of tool performance, recipe writing, and in-person technical support visits.

Bruker tailors services to your needs:

  • Priority technical support
  • Advance replacement parts and assemblies stored in regional warehouses for rapid response times
  • Application and training services

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