X-Ray Metrology for Compound Semiconductors

QCVelox-E

Optimum HRXRD performance for epilayer monitoring

System of choice for leading epi manufacturers

The essential tool for routine analysis of semiconductor substrates, epilayer structures and processed device wafers.

QCVELOX-E

The Bruker QCVelox-E is the system of choice for leading epi manufacturers to monitor their production lines. It is based on the industry standard QC3, with significant upgrades for throughput, reliability and ease of use. By using optimum X-ray source and optics technology, it couples high throughput with excellent repeatability to enable fast feedback of the layer quality and structure within a production environment.

High-Throughput
high-resolution XRD
Enables fast feedback on epilayer quality.
Automated
operation and data analysis
Aids productivity during routine analysis of semiconductor substrates, epilayer structures, and processed device wafers.
Optimized
X-ray source and optics technology
Balances resolution and intensity requirements for each application.
Features

Automated Operation

The QCVelox-E offers true automated operation, with straight-forward horizontal sample mounting, and fully automated alignment, measurements including full mapping without edge exclusion, and automated data analysis. An integrated barcode reader is fitted to aid productivity within a production environment.
 An optional robot handler is available for automated loading and measurement from cassette, along with options for SECS-GEM and other factory host systems.

The QCVelox-E is the essential tool for routine analysis of semiconductor substrates, epilayer structures and processed device wafers for all compound semiconductor materials.
 

软件支持

强大的自动化分析与报告软件

QCVelox-HR配备布鲁克一整套成熟可靠的软件套组: 

  • RADS:用于HRXRD数据分析,并依设定可生成组分、厚度、弛豫度报告
  • REFS:用于XRR数据分析,并依设定可生成厚度、密度、粗糙度报告
  • PeakFitting:用于FWHM计算与多峰拟合,可分析复杂结构中器件层组分
  • PeakSplit:用于倒易空间图谱的自动化二维拟合,支持离线弛豫度与倾斜度分析
  • QuickGraph:离线数据分析与基础分析工具
REFS software user interface during analysis of XRR data.

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