In-line XRD, HRXRD, and XRR
The 7300LSI automated diffractometer is designed for in-fab R&D and in-line production process monitoring of semiconductor films on full wafers. It is the tool of choice for the characterization of materials used in advanced logic and memory, as well as GaN/Si chip making. Expanding upon the 7300L base model, 7300LSI offers multiple modes in one tool (X-ray reflectivity, high-resolution XRD, grazing-incidence XRD, and wide-angle XRD) for strain metrology, thin film characterization, and phase analysis on blanket wafers. Optional S and I channels add µHRXRD and in-plane diffraction capabilities. Full automation ensures a productive and user-friendly solution for everything from measurement configuration switches and alignment to operation, analysis, and reporting.
The 7300LSI features industry-leading control and analysis and a host of unique features to speed your time to accurate and repeatable results. It provides full wafer mapping for all sizes and automates handling and alignment of standard and transparent substrates. The system's robust and intuitive analysis software streamlines sample analysis flow, from alignment to report, and enables RADS for HRXRD and REFS for XRR.
The highest resolution is provided by:
High throughput is guaranteed by:
The 7300LSI's versatile X-ray diffractometer provides multiple techniques for analyzing and monitoring thin films:
The 7300LSI is utilized worldwide in advanced nodes logic and memory fabs.
Key applications include:
All applications are enabled by our comprehensive analytical software suite for analysis, simulation, and fit: RADS and REFS.
The S channel offers small spot measurements of test structures on patterned wafers, with a spot size of 50x50µm at the sample. The channel can be either configured as a high-resolution beam, for strain measurements with µHRXRD on epitaxial layers, or as a µXRD beam for phase, crystallinity, and orientation measurements on crystalline films. The S channel comes with fully automated pattern recognition.
Phase and orientation monitoring on ultra-thin crystalline films is enabled with the optional I channel for in-plane XRD measurements.
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Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.