Combined Reflectometry-Ellipsometry Technique to Measure Graphite Down to Monolayer Thickness

Graphene, the single layer of graphite, has been the focus of many researchers internationally because of its unique electronic properties. However, the characterization of graphene films deposited on various substrates other than SiO2 is a challenging task.

This article discusses a novel approach for characterizing graphene films on various substrates and includes a case study and sample data demonstrating the technique's ability to successfully and reliably gather information that can be difficult to collect or even completely inaccessible by other measurement techniques.

_{KEYWORDS: Multi-angle reflectometry and ellipsometry; graphene; multi-layer thin films; polarized light measurements; bi-refringence; optical properties; thin film thickness}

Readers can expect to learn about:

• Combined, multi-angle reflectometry and ellipsometry: A rapid, sensitive, and non-destructive method for characterization of graphene on various substrates, including -- but not limited to — silicon;
• How this technique allows the user to model complex multilayer structures with reflection and ellipsometric data;
• [Case study] How to use multi-angle, polarized light measurements in the range of 190–1000nm to deduce the bi-refringence of multi-layer graphite and its thickness-dependent optical properties.