白光干涉量测方案

InSight WLI

适用于研发与生产的全自动高效量测方案

InSight WLI 搭载300mm晶圆处理系统

全自动的 InSight WLI 系统结合了卓越的光学表面测量功能与先进的晶圆处理系统,为用户提供前所未有的测量体验。该系统专为满足最为严苛的研发(R&D)、质量保证及工艺质量控制的需求而设计,搭载了专利性的探头倾斜设计(tip/tilt head)、独特的自校准激光参考( self-calibrating laser reference)、集成图案识别功能(pattern recognition)以及其他众多布鲁克独有的干涉测量技术。相比于其他量测系统, InSight WLI在非接触精度、高通量能力和操作便捷性方面遥遥领先,它能够广泛应用于各种在线生产量测和成像任务中。选择 InSight WLI,助力您在竞争激烈的市场中保持领先地位。

无缝集成
晶圆处理系统
适于大批量生产环境的在线量测功能
全自动
无论量测或分析
包括使用大量的预编程过滤器和分析库
准确
表面量测
能够在几乎任何表面上进行高质量的非接触式表面测量
自校准
激光参考
提供具有定量能力的高精度量测
Features

Specialized Inline Automation for Semiconductor Manufacturing

InSight WLI delivers fully automated, inline metrology with fast, consistent measurements and minimal operator intervention.

Core automation (factory + tool automation)

  • Factory integration: SECS/GEM‑compatible automation for 200 mm and 300 mm wafers
  • Tool automation: Recipe creation with autofocus and automatic tip/tilt to reduce manual setup

HVM‑focused workflow (inline flow + analytics)

  • Inline wafer flow: EFEM handling with wafer ID reading and pre‑alignment for repeatable, production‑ready operation
  • Production analytics: 35+ analyses and fast shape removal, auto hotspot detection, and database reporting with pass/fail criteria

Optional upgrades (automated targeting + enhanced detection)

  • Pattern recognition: Cognex pattern recognition to support automated targeting and workflow consistency
  • Advanced analysis: Vision64 Map™ for advanced visualization and enhanced defect detection/correlation
Features

准确性和稳定性的标杆

InSight WLI 在准确性和稳定性方面树立了新的行业标准,这得益于其多项创新技术:

  • 独特的测量传感器设计与专利性的双LED光源设计。
  • 自校准、专为优化量测的激光参考源。

  • 集成有减震功能的地装式机柜。

Interferometric advantages over other optical techniques

InSight WLI provides higher, more consistent vertical resolution than standard non-interferometric optical profilers, while improving throughput and measurement coverage in a single platform.

Compared to other optical and scanned optical beam technologies, InSight WLI uniquely delivers:

  • Full-field topography: calculates height independently for each pixel across the full field of view, reducing time to results vs scanned optical beam approaches
  • Transparent layer handling: segregates interfaces on transparent layers up to 100 nm
  • One head, multiple tasks: covers a wide application range with a single optical head and transitions between measurement modes

满足产线严苛需求的配置

Configurations for Demanding Advanced Packaging

  • Complete die flatness and CMP metrology solution
  • TSV and interconnect measurements
  • Hot-spot and defect detection on full reticle die

 

Factory Automation Ready

  • SECS/GEM 
  • S2/S8 Compliant
  • FDC, DCOL available
Applications

Coverage Across Semiconductor Process Steps

InSight WLI supports FEOL, BEOL, advanced packaging, and MEMS metrology with non-destructive measurement and built-in analysis. Applications include:

  • TSV/TGV monitoring
  • CD monitoring
  • Overlay monitoring
  • CMP monitoring
  • Die flatness qualification
  • Edge inspection (e.g., ERO)
  • Bump analysis
  • Etch/deposition monitoring
Measure wafer edge roll-off (ERO) characteristics automatically at radial positions along wafer circumference for bare and patterned wafers.

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