The FilmTek™ 3000 SE high-performance benchtop ellipsometer/reflection-transmission spectrophotometer provides a versatile single-instrument solution for investigating very thin absorbing films on transparent substrates.
This system combines our rotating compensator-based spectroscopic ellipsometer design with high-performance DUV multi-angle reflectometry and transmission measurement capabilities. It is consequently able to simultaneously and independently measure the thickness, refractive index, and extinction coefficient of very thin absorbing film samples on transparent substrates, as well as virtually any other transparent film sample <1 Å to 150 µm thick, with very high accuracy and repeatability.
The FilmTek 3000 SE's fully integrated configuration includes complete automation and advanced material modeling capabilities, allowing users to collect reflection, transmission, and ellipsometric data with exceptional ease and efficiency. Moreover, this system can be optionally configured to collect polarimetry data, making it more broadly applicable to use-cases requiring birefringence measurement (e.g., optical coating analysis). Its multimodal, easy-to-use, extendable design makes FilmTek 3000 SE ideal for academic- and R&D-level applications.
Enables simultaneous determination of:
Virtually all translucent films ranging in thickness from less than 1 Å to approximately 150 µm can be measured with high precision. Typical application areas include:
With flexible hardware and software that can be easily modified to satisfy unique customer requirements, particularly in academic and R&D environments.
|Film Thickness Range||0 Å to 150 µm|
|Film Thickness Accuracy||±1.0 Å for NIST traceable standard oxide 100 Å to 1 µm|
|Spectral Range||240 nm - 1700 nm (240 nm - 1000 nm is standard)|
|Measurement Spot Size||3 mm|
|Sample Size||2 mm - 300 mm (150 mm standard)|
|Spectral Resolution||0.3 nm - 2nm|
|Light Source||Regulated deuterium-halogen lamp (2,000 hrs lifetime)|
|Detector Type||2048 pixel Sony linear CCD array / 512 pixel cooled Hamamatsu InGaAs CCD array (NIR)|
|Automated Stage with Auto Focus||300 mm (200 mm is standard)|
|Computer||Multi-core processor with Windows™ 10 Operating System|
|Measurement Time||~2 sec per site (e.g., oxide film)|
|Film(s)||Thickness||Measured Parameters||Precision (1σ)|
|Oxide / Si||0 - 1000 Å||t||0.03 Å|
|1000 - 500,000 Å||t||0.005%|
|1000 Å||t , n||0.2 Å / 0.0001|
|15,000 Å||t , n||0.5 Å / 0.0001|
|150.000 Å||t , n||1.5 Å / 0.00001|
|Nitride / Si||200 - 10,000 Å||t||0.02%|
|500 - 10,000 Å||t , n||0.05% / 0.0005|
|Photoresist / Si||200 - 10,000 Å||t||0.02%|
|500 - 10,000 Å||t , n||0.05% / 0.0002|
|Polysilicon / Oxide / Si||200 - 10,000 Å||t Poly , t Oxide||0.2 Å / 0.1 Å|
|500 - 10,000 Å||t Poly , t Oxide||0.2 Å / 0.0005|