Photomask Repair

Extreme Lithography Cleaner

2nd Generation Photomask Dry Cleaning System

Production CO₂ Cryogenic Particle Removal

Extreme Lithography Cleaner (EL-C)

EL-C® systems are used for a wide variety of applications including front-side and back-side removal of particles deposited during production and handling, especially particle adders from other equipment. The EL-C process is dry and contamination free. Masks can be cleaned as often as needed with 100% soft particle removal efficiency down to 50nm sizes.

Production-Proven
CO2 dry cleaning process
Delivers reliable results for a wide variety of sites worldwide.
100%
soft particle removal efficiency
Removes particles down to 50 nm on both front and back sides.
Damage-Free
cryogenic aerosol photomask cleaning
Preserves fragile structures over 50+ cleaning cycles.
Features

Cryogenic Aerosol Photomask Cleaning Supporting Full Mask Clean

Unknown particle contamination on advanced photomasks during manufacture and mask handling in wafer fabs has been and remains a consistent problem. As mask materials become more sophisticated and geometries continue to shrink, the need for more efficient and damage free cleaning techniques has become increasingly important. Many of the older, established cleaning technologies have become less effective at soft particle removal and have become sources of feature damage and mask surface contamination. Several years ago, Bruker introduced a new mask cleaning alternative in the form of the Extreme Lithography Cleaner (EL-C®) product line of full mask cryogenic dry clean systems. The Bruker EL-C® system is now in production operation in multiple mask shops and in the mask management facilities of worldwide wafer fabs.

Fully Automated or Manual Load Operation

  • SMIF & Overhead Track compatible; RFID/OCR/Barcode readers
  • SECS/GEM compatible
  • Easy to operate; Highly user friendly GUI
Applications

Multiple Mask Cleaning Applications

  • EUV & Optical Front-side cleaning
  • EUV & Optical Back-side cleaning
  • Full mask clean
  • Local area (spot) clean
  • Pre-repair clean (differentiate “soft” verses “hard” defects)
  • Post-repair clean (nanomachining debris)
  • Persistent particle clean
  • Removal of adders from other equipment
  • Mask blank clean
Support

How Can We Help?

Service and Application Support to Optimize Tool Utilization

The decision to invest in high-performance metrology is based on more than instrument performance and price. Bruker is committed to keeping your tool running at the peak of up-time and productivity. We have a highly educated worldwide team of service and support personnel that takes great pride in first-time solution of issues. Our variety of service coverage programs can be customized to match your specific requirements, including optimization of tool performance, recipe writing, and in-person technical support visits.

Bruker tailors services to your needs:

  • Priority technical support
  • Advance replacement parts and assemblies stored in regional warehouses for rapid response times
  • Application and training services

Contact Us

Input value is invalid.

* Proszę wypełnić pola obowiązkowe.

Podaj swoje imię
Podaj swoje nazwisko
Podaj swój adres e-mail
Podaj swoją firmę/instytucję

    

Wprowadź poprawny numer telefonu.

ⓘ Najszybszym sposobem uzyskania odpowiedzi na pytanie.

Wprowadź poprawny numer telefonu.

ⓘ Najszybszym sposobem uzyskania odpowiedzi na pytanie.

Wprowadź poprawny numer telefonu.

ⓘ Najszybszym sposobem uzyskania odpowiedzi na pytanie.

Wprowadź poprawny numer telefonu.

ⓘ Najszybszym sposobem uzyskania odpowiedzi na pytanie.

Proszę dodać mnie do listy subskrypcji e-mail, dzięki czemu mogę otrzymywać zaproszenia webinarium, ogłoszenia produktów i wydarzenia w pobliżu.
Prosimy o zaakceptowanie Regulaminu