Extreme Lithography Cleaner
Extreme Lithography Cleaner (EL-C)
EL-C®系统广泛适用于各种应用场景，包括清除生产及处理过程中沉积在上表面和背面的颗粒，尤其适合清楚由其他设备引入的颗粒污染物。EL-C® 采用干式清洁方法，全程无污染。光罩可根据需要进行多次清洁，对直径小至50nm的软颗粒实现100%的彻底清除能效。
低温气溶胶清洁原理（Cryogenic Aerosol ）支持全种类光罩清洁
在光罩的生产制造和曝光处理过程中，未知颗粒的污染持续困扰着先进节点的光罩使用。而随着光罩材料变得越来越复杂，关键尺寸不断缩小，高效、无损的清洁技术变得日益重要。
数年前，布鲁克推出了全新的光罩清洁选择——Extreme Lithography Cleaner (EL-C®) 低温干洗系统。与传统清洁技术相比，该系统不仅显著提升了软颗粒的清除效率，还极大减少了对特征结构的损害及表面再污染的风险。如今，EL-C®系统已被广泛应用于全球各个晶圆及光罩厂，助力企业实现更高标准的质量控制与生产效率。
全自动或手动上样操作
- SMIF & Overhead Track 兼容; RFID/OCR/条形码识别
- SECS/GEM 兼容
- 操作方便；高度用户友好的GUI
多类光罩清洁能力
- EUV & Optical Front-side cleaning
- EUV & Optical Back-side cleaning
- Full mask clean
- Local area (spot) clean
- Pre-repair clean (differentiate “soft” verses “hard” defects)
- Post-repair clean (nanomachining debris)
- Persistent particle clean
- Removal of adders from other equipment
- Mask blank clean
How Can We Help?
Service and Application Support to Optimize Tool Utilization
The decision to invest in high-performance metrology is based on more than instrument performance and price. Bruker is committed to keeping your tool running at the peak of up-time and productivity. We have a highly educated worldwide team of service and support personnel that takes great pride in first-time solution of issues. Our variety of service coverage programs can be customized to match your specific requirements, including optimization of tool performance, recipe writing, and in-person technical support visits.
Bruker tailors services to your needs:
- Priority technical support
- Advance replacement parts and assemblies stored in regional warehouses for rapid response times
- Application and training services