FilmTek SE
FilmTek SE
The base model of our "SE" product line, the FilmTek™ SE automated benchtop spectroscopic ellipsometer offers users a streamlined option for quickly and easily collecting highly precise, repeatable measurements on a range of thin and ultra-thin film samples.
The FilmTek SE is a benchtop spectroscopic ellipsometer for single point measurements and can be configured with a manual or automated xy stage. At the click of a button, thousands of wavelengths are simultaneously collected in seconds, and the integrated auto-focus feature eliminates the tedious task of manual sample alignment required by comparable ellipsometers. Our film modeling software and in-house dispersion formula allow for easy data processing, giving accurate and precise real-time results.
Measurement Capabilities
Enables simultaneous determination of:
- Multiple layer thicknesses
- Indices of refraction [ n(λ) ]
- Extinction (absorption) coefficients [ k(λ) ]
- Energy band gap [ Eg ]
System Components
Standard:
- Spectroscopic ellipsometry with rotating compensator design (390nm-950nm)
- Automated stage with autofocus
- Ideal for measuring ultra-thin films (0.03 Å repeatability on native oxide)
- Affordable for nearly any budget
- Advanced material modeling software
- Bruker's generalized material model with advanced global optimization algorithms
Typical Application Areas
Virtually all translucent films ranging in thickness from less than 100 Å to approximately 50 µm can be measured with high precision.
Flexible hardware and software can be easily modified to satisfy unique customer requirements, particularly in academic and R&D environments.
Typical application areas include:
- Semiconductor and dielectric materials
- Multilayer optical coatings
- Optical antireflection coatings
- Thin metals
- Solar cells
Technical Specifications
| Film Thickness Range | 0 Å to 50 µm |
|---|---|
| Film Thickness Accuracy | ±1.0 Å for NIST traceable standard oxide 100 Å to 1 µm |
| Spectral Range | 380 nm - 950 nm |
| Measurement Spot Size | 3 mm |
| Sample Size | 2 mm - 300 mm (150 mm standard) |
| Spectral Resolution | 0.3 nm |
| Light Source | Regulated halogen lamp (10,000 hrs lifetime) |
| Detector Type | 2048 pixel Sony linear CCD array |
| Computer | Multi-core processor with Windows™ 10 Operating System |
| Measurement Time | ~2 sec per site (e.g., oxide film) |
Performance Specifications
| Film(s) | Thickness | Measured Parameters | Precision (1σ) |
|---|---|---|---|
| Oxide / Si | 0 - 1000 Å | t | 0.03 Å |
| 1000 - 500,000 Å | t | 0.005% | |
| 1000 Å | t , n | 0.2 Å / 0.0001 | |
| 15,000 Å | t , n | 0.5 Å / 0.0001 | |
| 150.000 Å | t , n | 1.5 Å / 0.00001 | |
| Nitride / Si | 200 - 10,000 Å | t | 0.02% |
| 500 - 10,000 Å | t , n | 0.05% / 0.0005 | |
| Photoresist / Si | 200 - 10,000 Å | t | 0.02% |
| 500 - 10,000 Å | t , n | 0.05% / 0.0002 | |
| Polysilicon / Oxide / Si | 200 - 10,000 Å | t Poly , t Oxide | 0.2 Å / 0.1 Å |
| 500 - 10,000 Å | t Poly , t Oxide | 0.2 Å / 0.0005 |