Advances in Characterization of Materials Using the New e-Flash EBSD Detectors

This webinar will provide details about the new generation of e–Flash EBSD detectors and the application fields they cover:

The High Definition e–Flash^HD detector with its unmatched high pixel resolution and high pattern quality – best solution for residual strain analysis a.k.a. HR-EBSD

The Fast and Sensitive e–Flash^FS detector for high speed measurements in both: EBSD and TKD modes – best solution for all Hough transform based EBSD/TKD applications

Significant improvements in light sensitivity and CCD dark current make the new e–Flash^FS detector the perfect solution for applications like low kV EBSD, Transmission Kikuchi Diffraction (TKD) in SEM or 3D EBSD.

Application examples will demonstrate how the new e–Flash^FS detector makes possible ultra fast EBSD measurements on most materials. When retrofitted with OPTIMUS™ TKD detector head, the new e–Flash^FS detector enables orientation mapping at the nanoscale at speeds of up to 630 frames/sec.

The webinar will be round off by a 15-minute Q&A session where our experts will answer your questions.

• All-level users interested in material characterization by EBSD/EDS
• Researchers and specialists interested in Dark Field & Bright Field imaging as well as orientation mapping at the nanoscale
• FIB/SEM microscopists interested in advanced analytical techniques like 3D EDS/EBSD for material characterization