AFM 模式

纳米光刻

创建精确、可控的纳米尺度结构

纳米技术中一些最前沿的研究要求实现纳米尺度结构的精密加工和相互连接。阳极氧化纳米光刻技术通过对AFM探针施加电压，在针尖正下方的样品表面生成氧化层。由于氧化物仅在针尖下方形成，因此可以在样品上书写非常窄的氧化线。

布鲁克的NanoMan和NanoPlot软件包提供了友好的用户界面，可采用图形化指向和点击模式或自动化程序驱动模式，通过多种“书写”技术进行高清晰度纳米光刻。在 Dimension Icon® 系统上也可以使用压电响应力显微镜（PFM）进行光刻。

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使用SCM-PIT针尖在硅上进行阳极氧化，以制作纳米光刻南瓜。扫描尺寸 5μm，以阴影显示高度数据。

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