Surface Characterization of Semiconductor Materials and Devices

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Welcome, everybody, and thank you so much for joining today's virtual workshop on the surface characterization of semiconductors. Our event today is brought to you by Bruker Nano Surfaces and Metrology division of North America. My name is Mike Berg, I'll be your host today, and I am the nanoindentation Product Specialist for the Bruker Hysitron business unit in Minneapolis.

We've got an exciting program today for everyone with a number of our applications experts joining to share about Bruker technologies and their applications, and to answer your questions.

Before we get started with the program, I wanted to bring up a few housekeeping items. Today's event is being recorded, so you will all be receiving a follow up email so you can view the on demand content afterwards. Feel free to share this with your colleagues or go back and rewatch sections of interest or that you may have missed.

We're encouraging you to submit your questions at any time during the talks. Each of our talks will have approximately 20 minutes, and then we'll reserve around five minutes for Q&A on each talk. You can submit your questions in the "Question" box of the GoToWebinar meeting dashboard, and for the questions we don't have time to address after each of the tal, we'll have an end-of-session Q&A in which we'll try to get to all of the questions. Otherwise, you can also write in directly by email after the event. You also have the flexibility to resize your webcam screen, as well as the presentation screen, so feel free to use those features.

Before we get to the agenda, I just wanted to also point out that we will be featuring a number of technologies from the Bruker Nano Surfaces product portfolio in the talks today, starting with the high resolution Dimension HPI atomic force microscope, then the Anasys nanoIR3 spectrometer, the Hysitron TI 980 nanoindenter for nanoindentation and no scratch, the Contour GTX optical profiler, the DektakXT stylus profiler, the TriboLab CMP tribometer, and, lastly, the Insight CAP HP automated AFM metrology tool.

So just a quick summary of our program today:

1. Our first talk will be on AFM applications for semiconductors, including automation, metrology and advanced techniques by John Thornton, from our Boston Area Bruker office.
2. Then we'll move to the Santa Barbara, California Office, we're Cassandra Phillips will be talking about nanoscale chemical analysis of contaminants using photothermal AFM-IR.
3. We'll move over then to our Minneapolis area office, we're Douglas Stauffer will be speaking about mechanical characterization of semiconductor samples and devices with the nanoindentation instruments.
   
4. Then over to the Boston area office, again, where Sandeep Basu will be speaking about semiconductor 3D metrology using optical and stylus profiling.
5. Then we will move to the San Jose office where Kora Farokhzadeh will be talking about the TriboLab CMP bridging the gap between bench-scale research commercial manufacturing.
6. And, finally, also from the San Jose office, Ingo Schmitz will be presenting on the automated surface characterization of semiconductor wafers for yield management.