Trace Element Sensitivity with Minimal Sample Preparation
High-Speed Elemental X-ray Mapping even over Large Areas
Film Thickness Analysis
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10 ppm
detection limit
Enabling trace element analysis due to the lower spectral background
4 mm/s
travel speed
The optional Rapid Stage enables high-speed mapping over large areas
1 nm - 40 µm
layer thickness range
Thin films starting from 1 nm up to multiple layer structures of 40 µm can be analyzed
Micro-XRF as a Complimentary Analytical Technique to EDS Analysis in the SEM
Micro-X-ray Fluorescence (Micro- XRF) spectroscopy analysis is a complementary non-destructive analytical technique to traditional Energy Dispersive Spectroscopy (EDS) analysis using a Scanning Electron Microscope (SEM). Such analyses are important for the characterization of the elemental composition within unknown samples ranging from large centimeter sized inhomogeneous specimens down to small micrometer particles.
X-ray excitation yields a much higher sensitivity for trace element detection (down to as low as 10 ppm for certain elements), an extended X-ray spectral range (up to 40 keV), as well as information from greater depth within the sample.
Equipped with an X-ray tube in combination with a micro-focusing X-ray optic yields small spot sizes of 30 µm with high intensity throughput.
A modular piezo-based stage, specially designed to mount on top of the existing SEM stage enables high-speed elemental X-ray mapping “on the fly” over large areas up to a speed of 4 mm/ sec. This enables the acquisition of X-ray mapping data over a sample size of 50 x 50 mm (or higher), incorporating light element spectral data as well as trace element and/ or higher energy X-ray data in a fast and user-friendly workflow.
The larger depth of X-ray excitation allows the characterization of multilayer systems starting from 1 nm and ranging up to 40 µm, which is not possible with electron excitation.
Expand your SEM analytical capabilities with the Micro-XRF and Rapid Stage
Dual beam potential, both an e-beam and an X-ray beam, which offers new possibilities for the material characterization - Investigate samples simultaneously with both sources.
Using the same detector for simultaneous e-beam/ micro-XRF acquisition, incorporating light element spectral data as well as trace element and/ or higher energy X-ray data.
Combined EDS and micro-XRF quantification results in a more complete sample characterization by combining the better light element sensitivity of electron excitation with the better trace element sensitivity of XRF.
Simultaneous mapping with micro-XRF and e-beam excitation, combining the advantages from both worlds. Exciting the light elements (carbon to sodium) using the e-beam and heavier elements by micro-XRF.
Separate peaks & extended spectral range enables the capability to see the high energy K- lines since they are less complex and less overlapped.
Minimum sample prep – no conductive sample surface and no extensive polishing required