Delta-X
Delta-X
The Bruker Delta-X is the latest generation of X-ray metrology system for semiconductor thin film analysis for materials’ research, process development and quality control. Featuring fully automated source optics, the system can switch between standard XRD, High-Resolution XRD (HRXRD) and X-ray reflectivity modes without user intervention. Measurements are fully automated within recipes with the ability to also perform more esoteric measurements in semi-manual mode.
Full 300mm Wafer Mapping
The instrument is designed for a variety of thin-film applications, including high resolution rocking curves, reciprocal space mapping, X-ray reflectivity, Grazing Incidence XRD, Phase ID, residual stress, film texture and grain size analysis, and XRF.
The sample stage consists of a robust 5-axis Eulerian cradle, with full 300 mm wafer mapping, and capacity for both large and small samples. Multiple sample locations for smaller samples are provided to enable multiple measurements across multiple samples to be queued and performed automatically, even of different measurement types.