This one-hour webinar provides a detailed and methodical explanation of spectroscopic reflectometry and ellipsometry techniques and the use and advantages of polarized light techniques for measuring thin films - specifically films on silicon and today's complex semiconductor devices (multi-layer/multi-stack).
Topics covered in this expert-led discussion include:
Find out more about the technology featured in this webinar and our industry-leading FilmTek thin film measurement tools:
Non-contact optical spectroscopic reflectometry, spectroscopic ellipsometry, and multiple-angle reflectometry technques provide a complementary approach to AFM and profilometry for the complete morphological and optical characterization of single or multi-layer thin films.
Like AFM and profilometry, these techniques operate by directing light at a sample of interest. Change in the reflected intensity or polarization of the light is then modeled to infer physical parameters of interest. Specifically:
Bruker's FilmTek tools enable thin film measurements and analyses that are either inaccessible or unreliable by traditional metrology instruments. Three key technologies enable the unique performance of FilmTek optical metrology tools:
Additional notable FilmTek features also discussed in this webinar include:
FilmTek tools’ unique combination of proprietary measurement technologies, patented optical design, and proprietary software results in unparalleled optical metrology performance. The speaker demonstrates this performance for production and QA/QC use cases in medical devices and semiconductor devices, including using:
The presenter also answers questions from the audience about specific capabilities, sample compatibility, and product selection. Among the answered questions were: