This webinar explains how photothermal AFM-IR spectroscopy and imaging provide ideal solutions to chemically characterize the organic contaminants, nano-patterned metal/low-k dielectrics, and directed self-assembly of block copolymers used for advanced micro/nano-fabrication.
Due to the systematic shrinking of the size of devices in the semiconductor industry, characterizing nanoscale surface contaminations in interconnects and circuitries has become a pivotal issue in test and failure analysis. Continuous development in process technology/engineering has led to the fabrication of semiconductor devices with sub-µm feature resolution, which in turn demands high-resolution analytical tools for proper characterization.
Nanoscale AFM-IR spectroscopy is a non-destructive chemical analysis method that takes advantage of the nanoscale capabilities of AFM and outputs easy-to-understand, FTIR-like spectra. As described by the presenters, the advantages of nanoscale AFM-IR can be leveraged in the semiconductor industry in many ways, like for chemical characterization of organic contaminants, nano-patterned metal/low-k dielectrics, and directed self-assembly of block copolymers.
Find out more information about Bruker's solutions for nanoIR Spectroscopy:
Cassandra Phillips, Ph.D.
Application Scientist, Bruker
Dr. Anirban Roy
Senior Applications Scientist