View this online lab session to see live demos and interesting talks about Bruker’s solutions for nanometer-scale surface characterization of semiconductor materials and devices.
This lab session includes:
Join us for this online lab session to see real-time, in-lab demos and interesting talks with Dr Peter De Wolf, Bruker's Worldwide Director of Applications, and his team.
This workshop highlights how Bruker’s high-performance metrology techniques can provide new impulses for your research and assist in the nanometer-scale surface characterization of semiconductor materials and devices.
Our automated metrology solutions enable the streamlining of nanomechanical property sampling, from nanoscale-to-microscale indentation to surface roughness measurement, chemical mechanical planarization (CMP), and etch-depth measurements on the most current technology nodes and wafers.
We demonstrate the capabilities of high-resolution, in-situ scanning probe microscopy (SPM) imaging, high-speed mechanical property mapping, and Optical (WLI) Profiling and Stylus Profiling to provide an in-depth explorationof material behavior at the nanoscale, ideal for R&D and the monitoring and improvement of manufacturing processes.
This workshop was recorded on: Wednesday, April 21st, 2021