Key Semiconductor Metrology Publications

Year Technology Current Tool Description Reference/DOI Publisher Authors
2018 HRXRD JVX7300LSI High-Resolution X-Ray Diffraction Characterization and Metrology for Advanced Logic 31, 1068-1068 Meeting Abstracts The Electrochemical Society Wormington, Matthew; Ryan, Paul A; Kasper, Nikolai; Gin, Peter;
2017 HRXRD JVX7300LSI Processing technologies for advanced Ge devices 6, 1, P14-P20 ECS Journal of Solid State Science and Technology Loo, Roger; Hikavyy, Andriy Yakovitch; Witters, Liesbeth; Schulze, Andreas; Arimura, Hiroaki; Cott, Daire; Mitard, Jerome; Porret, Clement; Mertens, Hans; Ryan, Paul;
2017 XRDI JVSensus - QCTT Crystalline damage in silicon wafers and'rare event'failure introduced by low-energy mechanical impact 63, 40-44 Materials Science in Semiconductor Processing Atrash, F; Meshi, I; Krokhmal, A; Ryan, P; Wormington, M; Sherman, D;
2017 HRXRD JVX7300LSI Observation and understanding of anisotropic strain relaxation in selectively grown SiGe fin structures 28, 14, 145703 Nanotechnology Schulze, Andreas; Loo, Roger; Ryan, Paul; Wormington, Matthew; Favia, Paola; Witters, Liesbeth; Collaert, Nadine; Bender, H; Vandervorst, W; Caymax, M;
2017 HRXRD JVX7300LSI Strain and Compositional Analysis of (Si) Ge Fin Structures Using High Resolution X‐Ray Diffraction 14, 12, 1700156 physica status solidi c Schulze, Andreas; Loo, Roger; Witters, Liesbeth; Mertens, Hans; Gawlik, Andrzej; Horiguchi, Naoto; Collaert, Nadine; Wormington, Matthew; Ryan, Paul; Vandervorst, Wilfried;
2017 HRXRD JVX7300LSI Strain and composition monitoring in various (Si) Ge fin structures using in-line HRXRD Schulze, Andreas; Loo, Roger; Witters, Liesbeth; Mertens, Hans; Collaert, Nadine; Horiguchi, Naoto; Wormington, Matthew; Ryan, Paul; Vandervorst, Wilfried; Caymax, Matty;
2017 XRDI JVSensus - QCTT Gate Oxide Yield Improvement for 0.18μm Power Semiconductor Devices with Deep Trenches 978-1-5090-5448-0/17/$31.00 ©2017 IEEE
2017 HRXRD / XRR JVX7300LSI / JVX7300HR Materials characterization for process integration of multi-channel gate all around (GAA) devices Proceedings Volume 10145, Metrology, Inspection, and Process Control for Microlithography XXXI; 101451U (2017) Gangadhara Raja Muthinti; Nicolas Loubet; Robin Chao; Abraham A. de la Peña; Juntao Li; Michael A. Guillorn; Tenko Yamashita; Sivananda Kanakasabapathy; John Gaudiello; Aron J. Cepler; Matthew Sendelbach; Susan Emans; Shay Wolfling; Avron Ger; Daniel Kandel; Roy Koret; Wei Ti Lee; Peter Gin; Kevin Matney; Matthew Wormington
2016 HRXRD JVX7300LSI Inline monitoring of SiGe strain relaxed buffers (SRBs) using high-resolution X-ray diffraction: AM: Advanced metrology 44-49 Advanced Semiconductor Manufacturing Conference (ASMC), 2016 27th Annual SEMI Mendoza, B; L'Herron, B; Loubet, N; Fronheiser, J; Reznicek, A; Gaudiello, J; Gin, P; Matney, KM; Wall, J; Ryan, P;
2016 HRXRD JVX7300LSI Advanced in-line metrology strategy for self-aligned quadruple patterning Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 977813 (2016) Robin Chao; Mary Breton; Benoit L'herron; Brock Mendoza; Raja Muthinti; Florence Nelson; Abraham De La Pena; Fee li Le; Eric Miller; Stuart Sieg; James Demarest; Peter Gin; Matthew Wormington; Aron Cepler; Cornel Bozdog; Matthew Sendelbach; Shay Wolfling; Tom Cardinal; Sivananda Kanakasabapathy; John Gaudiello; Nelson Felix
2016 XRDI JVSensus - QCTT Imaging of strain from deep trenches using XRDI 978-1-4673-8259-5/16/$31.00  c 2016 IEEE
2014 HRXRD JVX7300LSI Optical properties of pseudomorphic Ge1−xSnx (x = 0 to 0.11) alloys on Ge(001) AIP
2014 HRXRD JVX7300LSI / JVX7300HR Benefit of Combining Metrology Techniques for Thin SiGe Layers ASMC
2014 HRXRD JVX7300LSI Measurement of periodicity and strain in arrays of single crystal silicon and pseudomorphic Si1−xGex/Si fin structures using x-ray reciprocal space maps AIP
2014 HRXRD JVX7300LSI Selective-Area Metal Organic Vapor-Phase Epitaxy of InGaAs/InP Heterostrucures On Si For Advanced CMOS Devices 61, 2, 107-112 ECS Transactions Merckling, Clement; Waldron, Niamh; Jiang, Sijia; Guo, Weiming; Ryan, Paul; Collaert, Nadine; Caymax, Matty; Barla, Kathy; Heyns, Marc; Thean, Aaron;
2014 HRXRD JVX7300LSI Use of X-ray techniques in the development and production of novel transistor structures 39-40 Silicon-Germanium Technology and Device Meeting (ISTDM), 2014 7th International Hikavyy, Andriy; Rosseel, Erik; Witters, Liesbeth; Mertens, Hans; Ryan, Paul; Langer, Robert; Loo, Roger;
2014 HRXRD JVX7300LSI Optical properties of pseudomorphic Ge1−xSnx (x = 0 to 0.11) alloys on Ge(001) Journal of Vacuum Science & Technology B 32, 061805 (2014)
2014 HRXRD / XRR JVX7300LSI Measurement of periodicity and strain in arrays of single crystal silicon and pseudomorphic Si1−xGex/Si fin structures using x-ray reciprocal space maps Journal of Vacuum Science & Technology B 32, 021804 (2014); Manasa Medikonda, Gangadhara R. Muthinti, Jody Fronheiser, Vimal Kamineni, Matthew Wormington, Kevin Matney, Thomas N. Adam, Evguenia Karapetrova, Alain C. Diebold
2014 HRXRD / XRR JVX7300LSI Combining metrology techniques for in-line control of thin SiGe:B layers J. of Micro/Nanolithography, MEMS, and MOEMS, 13(4), 041402 (2014). Delphine Le Cunff; Thomas Nguyen; Romain Duru; Francesco Abbate; Jonny Hoglund; Nicolas Laurent; Frederic Pernot; Matthew Wormington
2014 XRDI JVSensus - QCTT X-ray Specs for Solar Cells Photovoltaics International 25 (Third Quarter, September 2014) 22-30. Tamzin Lafford, Richard Bytheway and Daniel Bright
2013 HRXRD JVX7300LSI Application of Inline X-ray Metrology for Defect Characterization of III-V/Si Heterostructures 50, 6, 341-350 ECS Transactions Hung, PY; Wormington, Matthew; Matney, Kevin; Ryan, Paul; Dunn, Kathleen; Wang, Albert; Hill, Richard; Wong, Man-Hoi; Price, Jimmy; Wang, Wei-E;
2013 XRDI JVSensus - QCTT X-ray diffraction imaging for predictive metrology of crack propagation in 450-mm diameter silicon wafers DOI:10.1017/S0885715613000122 Powder Diffraction. [Online] 28 (02), 95–99 Tanner, B.K., Wittge, J., Vagovič, P., Baumbach, T., et al.
2012 XRDI JVSensus - QCTT Prediction of the propagation probability of individual cracks in brittle single crystal materials AIP
2012 XRDI JVSensus - QCTT Slip band distribution in rapid thermally annealed silicon wafers. DOI:10.1063/1.4709446. Journal of Applied Physics. [Online] 111 (9), 094901 Garagorri, J., Elizalde, M.R., Fossati, M.C., Jacques, D., et al.
2012 XRDI JVSensus - QCTT Prediction of the propagation probability of individual cracks in brittle single crystal materials DOI:10.1063/1.4738994 Applied Physics Letters. [Online] 101 (4), 041903 Tanner, B.K., Fossati, M.C., Garagorri, J., Elizalde, M.R., et al.
2011 HRXRD - XRR JVX7300LSI / JVX7300HR Metrology of epitaxial thin-films by advanced HRXRD and XRR Electro IQ
2011 HRXRD / XRR JVX7300HR A Novel X-ray Diffraction and Reflectivity Tool for Front-End of Line Metrology FCMN2011
2011 XRDI JVSensus - QCTT Thermal slip sources at the extremity and bevel edge of silicon wafers DOI:10.1107/S0021889811012088 Journal of Applied Crystallography. [Online] 44 (3), 489–494 Tanner, B.K., Wittge, J., Allen, D., Fossati, M.C., et al
2010 HRXRD QC3 / QCVelox Production metrology of advanced LED structures using high-resolution X-ray diffraction Solid State Technology
2010 XRDI JVSensus - QCTT Dislocation sources and slip band nucleation from indents on silicon wafers DOI:10.1107/S0021889810029894 Journal of Applied Crystallography. [Online] 43 (5-1), 1036–1039 Wittge, J., Danilwesky, A.N., Allen, D., McNally, P.J., et al.
2010 XRDI JVSensus - QCTT X-ray diffraction imaging of dislocation generation related to microcracks in Si wafers DOI:10.1154/1.3392369 Powder Diffraction. [Online] 25 (Special Issue 02), 99–103 Wittge, J., Danilwesky, A.N., Allen, D., McNally, P.J., et al.
2008 HRXRD QC3 / QCVelox Mosaicity and stress effects on luminescence properties of GaN Physica Status Solidi (a)
2008 JVX7300LSI In-line characterization of hetero bipolar transistor base layers and pMOS devices with embedded SiGe by high-resolution x-ray diffraction Hikavyy, A; Nguyen, Ngoc Duy; Loo, R; Ryan, P; Wormington, M; Hopkins, J;
2007 HRXRD Asymmetric Relaxation of SiGe in Patterned Si Line Structures AIP conference proceedings 931, 1, 220-225
2007 HRXRD QC3 / QCVelox Effect of thickness on structural and electrical properties of GaN films Grown on SiN-treated sapphire Journal of Crystal Growth
2007 HRXRD JVX7300LSI Asymmetric Relaxation of SiGe in Patterned Si Line Structures AIP Conf. Proc.
2007 HRXRD JVX7300LSI - JV-DX In-line characterization of HBT base layers by high-resolution X-ray diffraction ECS Trans.
2007 HRXRD JVX7300LSI - JV-DX X-ray metrology tool for new device materials and structures Fabtech Semiconductor
2007 XRR JVX7300LSI - JV-DX Ultra Low-κ Metrology Using X-Ray Reflectivity And Small-Angle X-Ray Scattering Techniques AIP Conf. Proc.
2007 XRF JVX6200F - JVX7300F-W Under-bump Metallization (UBM) Control using X-ray Fluorescence (XRF) AIP Conf. Proc.
2007 XRR JVX7300RF-T CMP Control of Multi-Layer Inter-Layer Dielectrics (ILD) using X-ray Reflectivity AIP Conf. Proc.
2007 XRR JVX7300LSI Characterization of Surface Preparation for Epitaxial SiGe Process using X-ray Reflectivity ECS Trans.
2007 Advanced Metrology for Porous Low-k Integration into Cu back-end Processes 1-Sep ECS Transactions Ryan, Paul A; Bytheway, Richard; Gibson, Gary; Koga, Kazuhiro;
2007 HRXRD JVX7300LSI / JVX7300HR In-line characterization of heterojunction bipolar transistor base layers by high-resolution x-ray diffraction ECS Transactions 10, 1, 151-160 Nguyen, Ngoc Duy; Loo, Roger; Hikavyy, Andriy; Van Daele, Benny; Ryan, Paul; Wormington, Matthew; Hopkins, John;
2007 X-ray metrology for the semiconductor industry ECS Transactions 11, 3, 257-271 Bowen, Keith; Ryan, Paul;
2006 XRR - XRF JVX7300RF-T Application of x-ray metrology in the characterization of metal gate thin films J. Vac. Sci. Technol. B
2006 XRR - XRD JVX7300LSI - JV-DX Nucleation and growth study of atomic layer deposited HfO2 gate dielectrics resulting in improved scaling and electron mobility J. Appl. Phys.
2006 HRXRD JVX7300LSI - JV-DX Selective Epitaxy of Si/SiGe to Improve pMOS Devices by Recessed Source/Drain and/or Buried SiGe Channels ECS Trans.
2005 XRR Combined XRR and RS Measurements of Nickel Silicide Films AIP Conf. Proc.
2005 HRXRD - XRR Accuracy and Repeatability of X-Ray Metrology AIP Conf. Proc. Lafford, TA; Ryan, PA; Joyce, DE; Goorsky, MS; Tanner, BK;
2005 HRXRD Scans along arbitrary directions in Reciprocal space and the analysis of GaN films on SiC Journal of Physics D Wormington, Matthew; Lafford, Tamzin; Godny, Stéphane; Ryan, Paul; Loo, Roger; Hikavyy, Andriy; Bhouri, Nada; Caymax, Matty;
2005 HRXRD MBE Growth and Properties of GaAsSbN/GaAs Single Quantum Wells MRS
2005 HRXRD Annealing effects on the temperature dependence of photoluminescence Characteristics of GaAsSbN single-quantum wells J. Appl. Phys.
2003 HRXRD Direct measurement of twist mosaic in epitaxial GaN physica status solidi (a) 195,1,265-270